An Invitation to Submit Manuscripts and Subscribe to
Langmuir The ACS Journal of
Surfaces and Colloids
Arthur Adamson, Editor Arthur Hubbard, Associate Editor
This journal published by the American Chemical Society fills the void existing in current literature available today—Langmuir's broad coverage brings together authoritative papers from all aspects of this major field of chemistry!
Scope Langmuir includes fundamental and applied papers covering ultra-high vacuum surface chemistry and spectroscopy, heterogeneous catalysis, all aspects of interface chemistry involving fluids, and disperse systems. Specifically, Langmuir publishes peer-reviewed research in • 'Wet' Surface Chemistry surface tension · spread monolayers · wetting and contact angle · adsorption from solution · nucleation · fundamental aspects of flotation, detergency, emulsions, foams, lubrication, etc. • 'UHV Surface Chemistry solid surfaces in ultra-high vacuum including surface structure, composition and spectroscopy · and fundamental papers in heterogeneous cataysis • Disperse Systems colloidal suspension including aerosols · microemulsions · biological and polymeric colloids and membrane systems • Electrochemistry related to interfacial structure and processes Bimonthly issues of Langmuir feature experimental and theroetical original papers, letters to the editor, and book reviews, as well as some selected symposium collections. Papers having applied aspects are included. The editors of the journal welcome research papers in all areas of surface and colloid chemistry, and are establishing the journal as a unifying influence on research in this field. Langmuir does not bave page charges.
Editorial Advisory Board N.R. Armstrong, University of Arizona G.T. Barnes, University of Queensland, AUSTRALIA P. Biloen, University of Pittsburgh K.S. Birdi, Technical University of Denmark, DENMARK A.M. Bond, Deakin University, AUSTRALIA B.V. Derjaguin, Moscow University, USSR D.D. Eley, University of Nottingham, ENGLAND G. Ertl, Technical University of Munich, WEST GERMANY J. Fendlcr, Syracuse University T. Fort, Jr., California Polytechnic State University G Gaines, Jr., General Electric Corporate R&D W.A. Goddard, III, California Institute of Technology R.S. Hansen, Iowa State University J. Lyklema, Agricultural University, THE NETHERLANDS R.J. Madix, Stanford University J.A. Mann, Jr., Case Western Reserve University P. Mukerjee, University of Wisconsin K.J. Mysels, Research Consulting A.W. Neumann, University of Toronto, CANADA R. Ottewill, University of Bristol, ENGLAND H. Reiss, University of California at Los Angeles H.A. Resing, Naval Research Laboratory T. Rhodin, Cornell University S. Ross, Rensselaer Polytechnic University J. Rouquerol, Centre de Thermodynamique et de Microcalorimetrie du CNRS, FRANCE R.L. Rowell, University of Massachusetts R. Rye, Sandia National Laboratory H. Seki, IBM K. Shinoda, Yokohama National University, JAPAN G.A. Somorjai, University of California at Berkeley W.A. Steele, Pennsylvania State University
General Information for Authors Manuscript instructions are available in "Handbook for Authors of Papers in American Chemical Society Publications" (1978). Manuscripts should be submitted to either: Dr. Arthur Adamson, Editor Department of Chemistry University of Southern California Los Angeles, CA 90089 Dr. Arthur T. Hubbard, Associate Editor Department of Chemistry University of California at Santa Barbara Santa Barbara, CA 93106
Subscription Information Langmuir Published Bimonthly
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