Chemical Vapor Deposition of Metal Fluorides Using Sodium and

Chem. Mater. 1994,6, 1684-1692

1684

Chemical Vapor Deposition of Metal Fluorides Using Sodium and Zirconium Fluoroalkoxides John A. Samuels, Wen-C. Chiang, Chung-P. Yu, Elizabeth Apen, David C. Smith, David V. Baxter,* and Kenneth G. Caulton* Department of Chemistry, Zndiana University, Bloomington, Zndiana 47405 Received March 4,1994. Revised Manuscript Received July 14, 1994@

CVD onto borosilicate glass from (NaORf)4and from Zr(ORd4 gives NaF and ZrF4 films, respectively. Various fluorinated groups 0%= OCH(CF& and OCMes-,(CF3), ( n = 1-3) are studied, and metal-free fluorocarbon products are analyzed (lH and I9F NMR spectra) t o show that the transfer of F from carbon to metal occurs with 1,2-migration of a group in the alkoxide to the carbon losing the fluorine; such migration is increasingly facile in the order CF3