Correction to Enthalpies and Entropies of Adsorption on Well-Defined

Addition/Correction pubs.acs.org/CR

Correction to Enthalpies and Entropies of Adsorption on Well-Defined Oxide Surfaces: Experimental Measurements Charles T. Campbell* and Jason R. V. Sellers Chem. Rev. 2013, 113, 4106−4135. DOI: 10.1021/cr300329s

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here is an erroneous entry in Table 3 on page 4115. The second-to-last entry, for formic acid on NiO(111), should be deleted. The TPD peak described in this entry was actually for the recombinative desorption of dissociatively adsorbed formic acid (i.e., surface formate plus H to give HCOOH gas) on NiO(100). Thus, it should have appeared in Table 4 instead, with revised entries as written below.

AUTHOR INFORMATION Corresponding Author

*E-mail: [email protected]. ORCID

Charles T. Campbell: 0000-0002-5024-8210 Table 4. Addition to Table 4 dissociatively adsorbed molecule

oxide surface

adsorption site

Tp/K

β/(K/s)

log(ν/s−1)

−ΔHad0/(kJ/mol)

citation

formic acid

NiO(100)

metal

375

5

17

126

130

© 2013 American Chemical Society

A

DOI: 10.1021/acs.chemrev.7b00175 Chem. Rev. XXXX, XXX, XXX−XXX