Chem. Mater. 2008, 20, 4595–4601
4595
Device Fabrication by Easy Soft Imprint Nano-Lithography Isaac W. Moran,† Alejandro L. Briseno,‡ Stephen Loser,† and Kenneth R. Carter*,† Department of Chemistry, UniVersity of Washington, Seattle, Washington 98195, and Polymer Science and Engineering Department, Conte Center for Polymer Research, UniVersity of Massachusetts Amherst, 120 GoVernors DriVe, Amherst, Massachusetts 01003 ReceiVed February 18, 2008. ReVised Manuscript ReceiVed April 14, 2008
A new robust and exceptionally simple procedure for soft nano-imprint lithography (Soft-NIL) is described, which provides easy access to nanoscale patterns of a host of active materials on a Si/SiOx surface. Partial curing of a thiol-ene based UV cross-linkable resin (
