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Microscopy Course
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48 A
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ANALYTICAL CHEMISTRY
J. Alicino, V. Aluise, R. Belcher (Eng land), A. A. Benedetti-Pichler, F . Bermejo-Martinez (Spain), M . Bobtelsky (Israel), L. Brancone, B. Bobranski ( P o land), J. Brownlee, M . F . Buckles, F . Burriel-Marti (Spain), K. L. Cheng, N . D. Cheronis, C. Cimerman (Israel), J. M . Corliss, S. S. Cruikshank, P . Elving, L. Erdey (Hungary), L. S. Ettre, P . N . Fedoseev (U.S.S.R.), F . Feigl (Brazil), T. R. F . W. Fennell (England), R. Fischer (Austria), H . Flaschka, L. W. Gamble, D. Gardiner, P. D . Garn, P . Gaskins, A. Gerade, M. Gilpin (Northern Ireland), G. Gorbach (Austria), D . Grabar, G. Grassini (Italy), W. G. Guldner, G. Gustin, M. Gutterson, C. Haas, J. B. Headridge (England), J. Hetherington, C. Hishta, A. Holasek (Austria), H . Holness (England), K. Hozumi (Japan), E . W. D. Huffman, G. Ingram (England), S. Jacobs (England), B. Kahan, M . T. Kelley, W. Kemula (Poland), D . K e t chum, W. J. Kirsten (Sweden), A. Kofler (Austria), J. Korbl (Czechoslovakia), J. A. Kuck, M. Kuhnert-Brandstatter (Aus tria), A. Lacourt (Belgium), H . Leib (Austria), A. M. G. MacDonald (Eng land), R. J. Magee (Northern Ireland), H . Malissa (Austria), L. Malter, H . K. Mangold, C. Maresh, W. C. McCrone, W. McNevin, W. Merz (Germany), T . Mitsui (Japan), J. Monkman (Canada), G. Morrison, C. Ogg, W. Padowitz (Switzerland), S. R. Palit (India), S. Patton, R. Pribil (Czechoslovakia), A. Ringbom (Finland), C. A. Rush, E . Sawicki, H . F . Schaeffer, H . Schildknecht (Germany), F . Schneider, W. Schoniger (Switzerland), E. Schulek (Hungary), E . Schwarz-Bergkampf (Austria), W. Simon (Switzerland), T. Somiya (Japan), H . Spitzy (Austria), A. Steyermark, S. J. Tassinari, B. A. Thompson, A. M. Trozzolo, D. Van Slyke, H . Wagner (Switzer land), H . Waldmann (Switzerland), E . Wiesenberger (Germany), . L. Wiesner (Germany), M. L. Willard, C. L. Wilson (Northern Ireland), H . Wist, E . Wollish, J. Zarembo, W. Zimmerman (Australia), J. Zyka (Czechoslovakia).
Registration closes J u n e 15 for Crirnell University's s u m m e r course in chemical microscopy, t o be given J u l y 10 to 28. Enrollment is limited t o al low individual instruction and adjust m e n t for individual needs. Inquiries should be sent t o C. W . Mason, School of Chemical Engineer ing, Cornell University, I t h a c a , Ν . Υ.