ARTICLE
Atomic Layer Deposition of a Submonolayer Catalyst for the Enhanced Photoelectrochemical Performance of Water Oxidation with Hematite ,z
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Shannon C. Riha,†,‡,2 Benjamin M. Klahr,§,2 Eric C. Tyo, So¨nke Seifert,^ Stefan Vajda,†, Thomas W. Hamann,§,* and Alex B. F. Martinson†,‡,*
Michael J. Pellin,†,‡
Materials Science Division, Argonne National Laboratory, Argonne, Illinois 60439, United States, ‡ArgonneNorthwestern Solar Energy Research (ANSER) Center, Argonne National Laboratory, Argonne, Illinois 60439, United States, §Department of Chemistry, Michigan State University, East Lansing, Michigan 48824-1322, United States, ^X-ray Science Division, Argonne National Laboratory, Argonne, Illinois 60439, United States, Department of Chemical and Environmental Engineering, School of Engineering & Applied Science, Yale University, New Haven, Connecticut 06520, United States, and zNanoscience and Technology Division, Argonne National Laboratory, Argonne, Illinois 60439, United States. 2These authors contributed equally. )
†
ABSTRACT Hematite photoanodes were coated with an ultrathin cobalt
oxide layer by atomic layer deposition (ALD). The optimal coating;1 ALD cycle, which amounts to
