Atomic Layer Deposition on Electrospun Polymer Fibers as a Direct

Feb 6, 2007 - Atomic layer deposition (ALD) of Al2O3 on electrospun poly(vinyl alcohol) microfiber templates is demonstrated as an effective and robus...
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Atomic Layer Deposition on Electrospun Polymer Fibers as a Direct Route to Al2O3 Microtubes with Precise Wall Thickness Control

2007 Vol. 7, No. 3 719-722

Qing Peng,† Xiao-Yu Sun,† Joseph C. Spagnola,‡ G. Kevin Hyde,§ Richard J. Spontak,†,‡ and Gregory N. Parsons*,†,‡ Departments of Chemical and Biomolecular Engineering, Materials Science & Engineering, and Textile Engineering, Chemistry and Science, North Carolina State UniVersity, Raleigh, North Carolina 27695 Received December 14, 2006; Revised Manuscript Received January 16, 2007

ABSTRACT Atomic layer deposition (ALD) of Al2O3 on electrospun poly(vinyl alcohol) microfiber templates is demonstrated as an effective and robust strategy by which to fabricate long and uniform metal-oxide microtubes. The wall thickness is shown to be precisely controlled within a molecular layer or so by adjusting the number of ALD cycles utilized. By judicious selection of the electrospinning and ALD parameters, designer tubes of various sizes and inorganic materials can be synthesized.

Inorganic microtubes with precisely defined nanoscale walls have attracted considerable attention due to their potential application in technologies related, but not limited, to electronics, photonics, nanofluidics, medicine, sensing, catalysis, and controlled release.1 A variety of different processes have been developed to fabricate such tubes from a wide range of materials. Among those processes, the template-directed approach represents a straightforward and facile route to the fabrication of nano-/microscale structures with hollow interiors. Nanorods,2 carbon nanotubes,3,4 and porous media5,6 have all been successfully used as templates in this vein. Such templates are, however, expensive and difficult to produce in large volume. Natural materials including cotton and paper7,8 have also been used as templates, but the resultant nano-/microscale structures are not easily controlled. In this work, we employ atomic layer deposition (ALD) on electrospun polymer fibers as a direct means by which to construct inorganic microtubes with welldefined nanoscale walls composed of Al2O3 after the templating polymer is removed. The results reported here indicate that this strategy provides an attractive, high-fidelity, and low-cost route to inorganic microtubes, as well as nanoscale tubes and other complex shapes. Electrospinning has become a valuable and versatile route by which to obtain exceptionally long polymer nano-/ * Corresponding author: [email protected]. † Department of Chemical and Biomolecular Engineering. ‡ Department of Materials Science & Engineering. § Department of Textile Engineering, Chemistry and Science. 10.1021/nl062948i CCC: $37.00 Published on Web 02/06/2007

© 2007 American Chemical Society

microscale fibers possessing uniform diameter and good composition control.9-14 Electrospun fibers are produced from polymer solutions as the electric field between a spinneret and a target is increased until the electrostatic force at the tip of the spinneret exceeds the surface tension of the solution drop. The resulting Taylor cone that forms is transformed into a continuous jet that forms solid fibers as the solvent evaporates. In combination with various surface modification tactics including physical vapor deposition (PVD),15,16 chemical vapor deposition (CVD),15 sol-gel processing,7 and spin-on glass (SOG) incorporation,16,17 electrospun templates have been used to fabricate metal,15 metal oxide,7,16 and polymer15,18 nanotubes. However each of these deposition methods is hindered by significant process limitations. For example, sol-gel chemistry has been successfully performed on electrospun fibers to generate TiO2 nanotubes,7 but uniform wetting of the huge surface area of the fiber matrix presents a significant and ongoing challenge for this method. On the other hand, PVD is a line-of-sight deposition technique that does not permit conformal deposition on fibers throughout the matrix. In CVD processes, depletion of precursor frequently limits uniform coating on large surface areas. Due to the limitations of these traditional deposition techniques, it is difficult to produce long nano-/ microtubes with smooth outer surfaces and uniform walls of controlled thickness at nanometer length scales. In this work, ALD19-22 has been applied to matrices of electrospun polymer fibers to fabricate Al2O3 microtubes with

Figure 1. Schematic diagram of vapor-phase, self-limiting atomic layer deposition (ALD) illustrating the cyclic process by which an Al2O3 surface coating is controllably constructed layer-by-layer from TMA and H2O precursors.

smooth wall surfaces and precisely controlled wall thickness. This strategy exploits a sequential, self-limiting deposition process that operates on the principle of alternating saturating surface reactions. During ALD, a specimen is exposed to a precursor vapor that forms a (sub)monolayer of the precursor on the substrate. After excess precursor is removed from the vapor phase by a purge gas (e.g., Ar), the reactant gas is subsequently pulsed onto the substrate, where it reacts with the adsorbed precursor layer to form a layer of the targetfilm-forming material. Since no gas-phase reaction occurs, the target film is grown layer-by-layer on the substrate, in which case the thickness of the deposited film can be accurately controlled by the number of cycles the process is repeated, as illustrated in Figure 1. Because of its unique process characteristics and controllability, ALD can be used to deposit conformal, uniformly thin films with precise thickness and composition control over large scales and onto substrates with complex topologies (including for example, fibers).8,22,23 Moreover, ALD is chemically versatile and has been used to fabricate layers of metals,24-26 metal oxides,27 metal nitrides,22,24 and other materials. An additional benefit of ALD is that the deposition of Al2O3,21,22 TiO2,8 and TiN24 can be conducted at relatively low temperatures (