Fabrication of Pt−Si Schottky Diodes Using Soft Lithographic

Fabrication of Pt−Si Schottky Diodes Using Soft Lithographic Patterning and Selective Chemical Vapor Deposition. Martin K. Erhardt, and Ralph G. Nuz...
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Langmuir 1999, 15, 4934

Additions and Corrections Fabrication of Pt-Si Schottky Diodes Using Soft Lithographic Patterning and Selective Chemical Vapor Deposition Martin K. Erhardt and Ralph G. Nuzzo* Langmuir 1999, 15, 2188-2193. The printed version of Figure 5a on page 2191 does not accurately convey the color levels of the original figure. An overall orange haze in the printed version creates the impression that the deposition was not selective. LA990563S 10.1021/la990563s Published on Web 06/11/1999

Formation and Stability of Complex MembraneMimetic Monolayers on Solid Supports Theodore M. Winger, Peter J. Ludovice, and Elliot L. Chaikof* Langmuir 1999, 15, 3866-3874. On page 3871, part B of Figure 4 was a duplication of part A. The correct Figure 4B is below.

Figure 4B. Surface-associated radioactivity as a function of LP2 lipopeptide content in the DPPC supported monolayer. Modeled molecular areas for LP2 and DPPC are 171 and 70 Å2, respectively. Under these conditions, the model fits the experimental data for a lipid monolayer (n ) 1) on OTS. Experimental data presented as mean ( standard deviation. LA9905923 10.1021/la9905923 Published on Web 06/09/1999