Jiang Xu,*,† Shuyun Jiang,‡ and Yue Wang† Department of Material Science and Engineering, Nanjing University of Aeronautics and Astronautics, 29 Yudao Street, Nanjing 210016, People’s Republic of China, and Department of Mechanical Engineering, Southeast University, 2 Si Pai Lou, Nanjing 210096, People’s Republic of China
ABSTRACT In order to investigate the influence of the chromium content on the oxidation performance of the chromium-alloyed Mo5Si3, five kinds of sputter-deposited nanocrystalline (MoxCr1-x)5Si3 (x ) 1, 0.78, 0.75, 0.64, 0.57) films have been prepared on Ti-6A1-4 V alloy substrates by double-cathode glow discharge. X-ray diffraction, scanning electron microscopy, and transmission electron microscopy have been used to characterize the nanocrystalline (MoxCr1-x)5Si3 (x ) 1, 0.78, 0.75, 0.64, 0.57) films. The asdeposited films were free of crack having metallurgical bonding with a substrate and consisted of an outer (MoxCr1-x)5Si3 layer and an inner diffusion layer. The inner diffusion layer could be divided into a β-phase layer with high Mo content (>10 wt %) and an R′′/R′ layer with low Mo content (
