UV Photoelectron Spectroscopy of Polysilanes and Polygermanes

May 5, 1995 - 2 Institute for Molecular Science, Myodaiji, Okazaki 444, Japan. 3 NTT Basic Research ... ACS Symposium Series , Vol. 579. ISBN13: ...
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Chapter 32

UV

Photoelectron Spectroscopy of Polysilanes and Polygermanes 1

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Kazuhiko Seki , Akira Yuyama , Satoru Narioka , Hisao Ishii , Shinji Hasegawa, Hiroaki Isaka , Masaie Fujino , Michiya Fujiki , and Nobuo Matsumoto 3

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Department of Chemistry, Faculty of Science, Nagoya University, Furocho, Chikusa-ku, Nagoya 464-01, Japan Institute for Molecular Science, Myodaiji, Okazaki 444, Japan ΝTΤ Basic Research Laboratories, Wakamiya, Morinosato, Atsugi 243-01, Japan 2

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UV photoelectron spectra were measured for ten polymers with main chains composed of Si and Ge atoms. The spectra of poly(dial­ kylsilane)s were described well as the over­ lap of the spectra of constituent parts, while polysilanes with aryl side groups showed the effect of σ -π mixing. The spectra of polygermanes and Si-Ge block copolymers are fairly similar to those of corresponding polysilanes, while Si-Ge random copolymers show indications of the effect of the presence of many Si-Ge bonds. Recently polysilanes and polygermanes have attracted attention due t o t h e i r unique properties. These are mainly due t o σ-conjugation along the main chain, with possible applications t o photoresists, conducting polymers, and i n i t i a t o r s of polymerization, etc. (1,2). Knowledge of t h e i r e l e c t r o n i c structures forms the basis of under­ standing these i n t e r e s t i n g properties. So f a r there have been r e ­ ports on the valence e l e c t r o n i c structures of several polysilanes studied by UV photoelectron spectroscopy (UPS) (3-5), but they suf­ fered e i t h e r from low spectral q u a l i t y or from l i m i t e d coverage of the valence band. In t h i s work we report the whole valence electron­ i c structures of a series of polysilanes, polygermanes, and Si-Ge copolymers with UPS using synchrotron r a d i a t i o n , and analyze the r e s u l t s by comparison with the spectra of constituent parts. Experimental A l l the sample materials were synthesized at NTT. The samples for UPS measurements were prepared by spin-coating of 0.4 weight % toluene s o l u t i o n of each compound under N atmosphere. The samples 2

0097-6156/94/0579-0398$08.00/0 © 1994 American Chemical Society

Ito et al.; Polymeric Materials for Microelectronic Applications ACS Symposium Series; American Chemical Society: Washington, DC, 1995.

32. SEKI ET AL.

UV Photoelectron Spectroscopy of Polysilanes

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prepared under these conditions showed no sign of charging during the UPS measurement. The spectra were measured under u l t r a h i g h vacuum on the order of 10*" Pa by using an angle-resolving photoe l e c t r o n spectrometer at the beamline 8B2 of the UVSOR f a c i l i t y at I n s t i t u t e f o r Molecular Science. Monochromatized l i g h t from a plane grating monochromator (5) impinged on the sample, and the energy d i s t r i b u t i o n of photoelectrons was analyzed with a hemispherical e l e c t r o s t a t i c energy analyzer. The o v e r a l l r e s o l u t i o n was about 0.2 eV as deduced from the measurement of the Fermi edge of gold. No detectable damage by photon i r r a d i a t i o n was observed. A l l the meas­ urements were c a r r i e d out at room temperature. 8

Polysilanes Polydialkylsilanes. In Figure 1(a) the spectrum of poly(methylprop y l s i l a n e ) (SiMePr)^ at hy= 40 eV i s shown. We can c l e a r l y see several f i n e structure peaks i n the upper valence region, i n con­ t r a s t to previously reported spectra (3), which suffered from severe sample charging and do not show f i n e structure i n t h i s region. For comparison, reported UPS and XPS spectra of methane (7,8) propane (8,9), and permethyltetrasilane (10) are shown i n Figure l ( b ) - ( d ) . They show good correspondence with the spectrum of (SiMePr) . From such a comparison and l i t e r a t u r e assignments (4,5,10), we can ascribe the features i n 5-6 eV region to Si3p-derived