(rRNAs), which are found in all living organisms, for sorting out microbial populations. At present, rRNAs offer the most comprehensive database of sequenced nucleic acids, particularly for the 5S and 16S rRNAs (S refers to the sedimentation value following centrifugation). The nucleic acid analysis finds that rRNAs are highly conserved in both sequence and structure; howev er, variable sections offer a means to differentiate microorganisms by spe cies and genus. Once again, identifica tion depends on radioactively labeled oligonucleotides (10). The future progress of GEM field studies is clearly tied to the continued development of these analytical proce dures. Early experiments are providing the data necessary to understand the ecological impact of genetically altered microorganisms. However, scientific (and, ultimately, public) approval for any commercial GEM products will de pend on how well the analytical tools enable researchers to unravel the com plex environmental effects. Alan R. Newman
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(1) Baum, R. Chem. Eng. News 1989, April 24,30-32. (2) Lindow, S. E.; Panopoulos, N. J. In The Release of Genetically-Engineered Micro-Organisms; Sussman, M.; Collins, G. H.; Skinner, F. Α.; Stewart-Tull, D. E. Eds.; Academic Press: London, 1988; pp. 121—38 (3) Drahos, D. J.; Hemming, B. C McPherson, S. Bio /Technology 1986, 4, 439-44. (4) Drahos, D. J.; Barry, G. F.; Hemming, B. C; Brandt, E. J.; Skipper, H. D.; Kline, E. L.; Kluepfel, D. Α.; Hughes, Τ. Α.; Gooden, D. T. In The Release of Geneti cally-Engineered Micro-Organisms; Sussman, M; Collins, G. H.; Skinner, F. Α.; Stewart-Tull, D. E., Eds.; Academic Press: London, 1988; pp. 181-91. (5) Barry, G. F. Bio /Technology 1986, 4, 446—49.
(6) Colwell, R. R.; Somerville, C; Knight, I.; Straube, W. In The Release of Geneti cally-Engineered Micro-Organisms; Sussman, M.; Collins, G. H.; Skinner, F. Α.; Stewart-Tull, D. E., Eds.; Academic Press: London, 1988; pp. 47-60. (7) Glaser, D.; Keith, T.; Riley, P.; Cham bers, G.; Manning, J.; Hattingh, S.; Evans, R. In Biotechnology in the Environment; Omenn, G. S.; Teich, A. H., Eds.; Noyes Data Corp.: Park Ridge, NJ, 1986; pp. 114-64. (8) Bishop, D.H.L.; Entwistle, P. F.; Cam eron, I. R.; Allen, C. J.; Possee, R. D. In The Release of Genetically-Engineered Micro-Organisms; Sussman, M.; Collins, G. H.; Skinner, F. Α.; Stewart-Tull, D. E. Eds.; Academic Press: London, 1988; pp. 143-79. (9) Sommerville, C. C ; Knight, I. T. Straube, W. L.; Colwell, R. R. Appl. Envi ron. Microbiol. 1989,55,548-54. (10) Stahl, D. Α.; Flesher, B.; Mansfield, H. R.; Montgomery, L. Appl. Environ. Microbiol. 1988,54,1079-84.
The Chemistry of Acid Rain: Sources and Atmospheric Processes
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his new book takes a probing look at a high-priority environmental problem— the sources and chemistry of acidic species in the atmosphere. The editors be gin this volume with an overview chapter that provides a historical perspective and summarizes the understanding that has been developed over the last decade. You'll read subsequent chapters covering all as pects of this problem . . . from the accuracy of field measurements to highly sophisti cated modeling. Although the problems and solutions presented in this book are wide-ranging, you'll find the 27 chapters di vided into seven specific subject areas: • General • Receptor Models • Cloud Chemistry and Physics
• Kinetics • Wet and Dry Deposition • Experimental Methods • Fundamental Processes This volume provides essential information for those involved in the acid deposition field: atmospheric scientists, ecologists, en vironmental scientists, government re searchers, regulators, legislators, and gen eral scientists.
Electronic and Photonic Applications of Polymers
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et the most up-to-date information on the present rales of polymers in elec tronics and photonics. Gain insight into the latest developments and future trends in this rapidly changing field. Learn more about passive and active applications that include polymers as resists in microlithography, com ponents of optical recording systems, and uses in nonlinear optics, molecular electronics, and electronic and photonic conduction. Focus on advances in design and application and learn about cutting-edge research in the major areas of polymer resists, photonic appli cations, polymers in electronic packaging, poly meric materials as substrates and protective layers in laser recording, and much more. Cover these important topics; • Polymers for Electronic and Photonic Applications • Recent Advances in Organic Resist Materials • Materials and Processes for Deep-UV Lithography • Molecular Electronics Using Langmuir-Blodgett Films • Progress Toward Processable, Environmentally Stable Conducting Polymers • Polymers in Nonlinear Optics • Polymers In Optical Recording Find out the latest on new research—never before compiled in a single source! Murrae J. Bowden, Editor, Bell Communica tions Research
Russell W. Johnson, Editor, Allied Signal Engi neered Materials Research Center Glen E. Gordon, Editor, University of Maryland William Calkins and A.Z. Elzerman, Associate Editors Developedfroma symposium sponsored by the Divi sions of Petroleum Chemistry, Inc.; Nuclear Chemistry and Technology; Environmental Chemistry; and Fuel Chemistry of the American Chemical Society ACS Symposium Series No. 349 353 pages (1987) Clothbound ISBN 0-8412-1414-X LC 87-19404 US a Canada $59.95 Export $71.95 Order from: American Chemical Society
S. Richard Turner, Editor, Eastman Kodak Company Developed from a symposium sponsored by the Divi sion of Polymeric Materials: Science and Engineering of the American Chemical Society Advances in Chemistry Series No. 218 392 pages (1988) Clothbound ISBN 0-8412-1400-X LC 88-21099 US & Canada $94.95 Export $113.95 Order from: American Chemical Society
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