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John W. Olesik received his B.S. de gree from the University of Rochester in 1977 and his Ph.D. from the Univer sity of Wisconsin-Madison in 1982. He was a postdoctoral research associate at Indiana University before joining the faculty of UNC-CH in 1984. His research interests include optical spectroscopy, spectrochemical analy sis, fundamental processes in plasmas used for elemental analysis and mate rials processing, plasma diagnostic techniques (using emission, laser-in duced fluorescence, and MS), spectro scopic imaging and detectors, and de velopment of intelligent spectroche mical instruments.
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