Gmelin Handbook of Inorganic Chemistry, 8th Edition, Si, Silicon

to be up-to-date, and it is written with authority. Unfortunately, the English is bad. Veith's review is full of awkward expressions and sentences and...
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Organometallics, Vol. 2, No. 6, 1983 785

Book Reviews

Additions and Corrections R. G. Daniels and Leo A. Paquette: Silanes in Organic Synthesis. 18. Preparation and Reactivity of Optically Active Vinyl- and Dienylsilanes 1982, 1, 1449-1453.

GOF = 2.062, based on 1864 observed data and 151 variables. Coordinates relative to the C2/c cell are listed below. We thank R. E. Marsh for calling our attention to this error.

On page 1449, it is the (-)-enantiomer of l-naphthylphenylmethylchlorosilane that is meant in line 3 of the abstract and two lines above formula 4. On page 1452, two peaks were omitted in the ‘H NMR data for 26/27: 6 0.77, 0.74 (2 s, 3 H total).

X

0 0.1627 (1) 0.1438 (1) 0.1468 (1) 0.2034 (1) -0.0009 (2) -0.0535 (1) -0.0490 (2) 0.0104 ( 3 ) 0.0653 ( 2 ) 0.0597 (1) 0.1169 (1) 0.1192 ( 2 ) 0.1458 (1) 0.1567 (1) 0.1641 ( 2 ) 0.2405 (2)

George R. Newkome, Vinod K. Gupta, and Frank Fronczek: Palladium(I1) Complexes of Pyridine- and PyrazineBased Ligands with Bis(carbon-metal) Bonds. Ligand Synthesis, Complexation, and Crystal Structure 1982,1, 907-1910.

In this paper, the crystal structure of Pd(CllH12N0J2 was described in a space group of unnecessarily low symmetry. The published cell in triclinic space group Pi (misprinted as P1) may be transformed by the matrix

to a cell in monoclinic space grou C2/c, with dimensions a = 20.997 (3) A, b = 8.412 (2) c = 15.419 (2) A, /3 = 122.96 (1)O, and 2 = 4. The molecular symmetry is exactly, rather than approximately, C2. Refinement in the higher symmetry space group yielded R = 0.036, R, = 0.056, and

1,

Y

-0.25284 ( 2 ) -0.0727 (3) -0.0124 ( 2 ) -0.4996 (3) -0.2717 ( 2 ) -0.2520 (2) -0.1825 ( 4 ) -0.1871 ( 6 ) -0.2699 ( 4 ) -0.3364 ( 4 ) -0.3233 ( 3 ) -0.3886 ( 4 ) -0.2783 ( 3 ) -0.1151 ( 3 ) -0.3622 ( 3 ) 0.1490 ( 4 ) -0.3463 ( 5 )

z

-0.25 -0.0098 (1) -0.1626 ( 1 ) -0.2067 ( 1 ) -0.1939 ( 2 ) -0.1182 (3) -0.1071 ( 2 ) -0.0146 ( 2 ) 0.0676 ( 3 ) 0.0568 ( 2 ) -0.0366 ( 2 ) -0.0567 ( 2 ) -0.1363 ( 2 ) -0.0944 ( 2 ) -0.1811 ( 2 ) -0.1281 ( 3 ) -0.2380 ( 2 )

D. K. Towle, S. J. Landon, T. B. Brill, and T. H. Tulip: A Double Michaelis-Arbuzov Rearrangement Involving (q5-C6H5)Co12(CO) and P(OCH3)3. Formation of the Cobalt ”Supersandwich” Complex 1 9 8 2 , l (2), 295-301. On pages 295 and 299, the space group in the abstract and in Table 111,respectively, should be P 2 , l n rather than P21lC.

Book Reviews Gmelin Handbook of Inorganic Chemistry, 8th Edition, Si, Silicon. Supplement Volume B1. Silicon and Noble Gases; Silicon and Hydrogen (including SiH,-Oxygen Compounds). E. Hengge, H. Keller-Rudek, D. Koschel, U. Kruerke, and P. Meriet, volume authors. U. Kriierke, volume chief editor. Gmelin Institut fur Anorganische Chemie der Max-Planck-Gesellschaft zur Fdrderung der Wissenschaften and Springer-Verlag, Berlin/Heidelberg/New York. 1982. iv 259 pages. DM 711, $315.70 (in English).

+

The Gmelin silicon series B and C appeared in 1958 and 1959. In the intervening years, inorganic and, especially, organic silicon chemistry have been the subjects of continuous, brisk research activity in academic, government, and industrial laboratories throughout the world. The information that has accumulated on silicon compounds, old and new, during these years would fill a whole shelf full of Gmelin volumes, and it is the intention of the Gmelin Institute for Inorganic Chemistry to collect and publish all these new data in supplement volumes to both series B (Element and Compounds) and C (Organic Silicon Compounds). These volumes will be welcomed by many readers of this journal, and the Gmelin Institute is to be commended for making the decision to embark on this awesome task.

In the present book we have the first supplement volume to the silicon B series. The first topic covered, “Silicon and Noble Gases”, is easily dealt with in one sentence. The rest of the book deals with the hydrides and oxyhydrides of silicon. After brief reports on the adsorption of hydrogen on crystalline silicon, the discussion of silicon hydrides begins with unstable SiH, molecule8 (SiH, SiH2,SiH3) and ions (SiH,+, n = 1-5; SiH,-, n = 1-3 and 5). Of these, SiHz and SiH3- have received a fair amount of experimental attention and have a well-developed chemistry. Nearly half of the book is devoted to an account of all the information that has been gathered on monosilane, SiH4,since 1958 preparation, purification, handling procedures, physical properties, spectroscopy, thermochemistry, properties of the condensed phase, mass spectroscopy, thermal decomposition and chemical reactivity, analytical methods, and applications. It is likely that monosilane will become an important commercial intermediate in the production of pure silicon and, without doubt, there will be substantial additions to this already large amount of data. Disilane also is being mentioned currently as a more specialized precursor of pure silicon, and 27 pages of text and tables bring all the available information on this molecule. Interest in compounds with a Si=Si bond is currently very high, and while the parent compound H2Si=SiH2 has not been observed ex-

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perimentally, it has been fair game for the theoretical chemists whose calculations are summarized in this book. The isomeric silylsilylene, H3SiSiH, also is discussed. Whatever is known about the higher silanes, linear, branched, and cyclic, information obtained in large part in FBher’s laboratories, also is presented, as are the available literature data on the ill-defined “low-valent” solid silicon hydrides (- (Sib,2)z-(SiH2)=).The final short chapter covers compounds that contain Si-0 as well as Si-H bonds: H,Si(OH)&,, (theoretical calculations only), H3SiOLi, H3SiOSiH3, cyclic (H2SiO)” oligomers, and (HSiOl,s),. The reader also is referred to “mysterious patent claims” on the preparation of ”silicoformicacid”. Most of the work on the synthesis, structure, and chemistry of siloxene was reported in the Gmelin “B” (1959), but the work reported in the 36 references published since then is detailed in the last 5 pages of the book. The coverage of the literature in this book is well-nigh exhaustive and quite up-to-date (through the end of 1980, with some 1981 references included). In the SiH4 literature patents play an important role when preparation, purification, and applications are concerned, and it would appear that only patents that have been abstracted in “Chemical Abstracts” are included. The first supplement volume to the silicon B series is an execellent one, and we look forward to further additions. Dietmar Seyferth, Massachusetts Institute of Technology Gmelin Handbook of Inorganic Chemistry. 8th Supplement. B. Boron Compounds. 1st Supplement, Volume 3. Boron and Chalcogens. Carboranes. K. Beeker and T. Onak, volume authors, K. Niedenzu, volume editor. Gmelin Institut fur Anorganische Chemie der Max-Planck-Gesellschaft zur Furderung der Wissenschaften and Springer-Verlag, Berlin/Heidelberg/New York. 1981. v + 397 pages. DM 799, $471.50. The present book is the third and final volume of the threevolume supplement to the twenty-volume series on inorganic and, in part, organic boron compounds that was published by the Gmelin Institute of Inorganic Chemistry during the period 1974-1979. It is the aim of the supplement volumes to bring all of the many topics covered to a common December 31, 1977, literature cutoff date. The present volume includes the following topics that remain: boron-chalcogen compounds and carboranes. It also provides a useful 139-page formula index for the three supplement volumes. Covered in this book are all the diverse boron compounds that contain B-S, B-Se, and B-Te bonds, including inorganic compounds, boron hydride derivatives, adducts of sulfur-centered Lewis bases with trigonal boron compounds, and organic-substituted B-S and B-Se compounds. Of greater interest to the organometallic chemist will be the 151-page up-date of carboranes to December 1977 from a cutoff date of -1970 in Volume 2 of the boron series. Much new carborane chemistry, principally work by American and Russian authors, was published during those 7 years, and all this work is covered in this volume-from C5B1to C2B,, carboranes. Metallocarboranes are included for those cases in which the metal atom constitutes part of the principal polyhedral framework. Also included is a discussion of the ever-increasing organic chemistry of the C2BlOcarboranes. The boron-chalcogen portion of this book is written in German but has added English chapter titles and section headings. Onak’s carborane chapters, on the other hand, are written in English. For anyone active in research in any area of boron chemistry

Book Reviews the now 23-volume Gmelin boron series will be an indispensable aid. The exhaustive literature coverage through the end of 1977 will provide a reliable starting point for further searching of newer literature. Five years have now passed since the 1977 cutoff, and research in boron chemistry has continued at a brisk pace. It is hoped that a second supplement will be published in the not too distant future. Dietmar Seyferth, Massachusetts Institute of Technology Topics in Current Chemistry. 104. Organotin Compounds. F. L. Boschke, Managing Editor. Springer-Verlag, Berlin/Heidelberg/New York. 1982. 137 pages. $34.00. “Topics in Current Chemistry” is a topical review journal that masquerades as a hard cover series. In short and pricey volumes it brings several reviews in selected areas that may be rather broad or very narrow. The present volume is in the second category and contains three reviews on organotin chemistry: “Structure and Reactivity of Monomeric, Molecular Tin(I1) Compounds”, by M. Veith and 0. Recktenwald; ”Chirality, Static and Dynamic Stereochemistry of Organotin Compounds”, by M. Gielen; “Coordination Effects in Formation and Cross-Linking Reactions of Organotin Macromolecules”, by Z. M. 0. Rzaev. The review on tin(I1) compounds brings an up-to-date discussion by a leading contributor to this field. Dr. Veith has done some excellent research on tin(I1) chemistry and has provided clear accounts of this work in the German literature. The present review, written in English, does an excellent job of summarizing an interesting and active area of tin chemistry. The review seems to be up-to-date, and it is written with authority. Unfortunately, the English is bad. Veith‘s review is full of awkward expressions and sentences and errors of usage, grammar, and spelling. Some sentences are downright confusing. One might have thought that the editor would be alert to such problems of translation, but in the case of this book, he must have been out to lunch. Things are even worse in the third review by Rzaev that was translated from the Russian. Here the original writing style must have been bad to start with very disjointed, with an abundance of one-sentence paragraphs, and too many alphabet-soup abbreviations, such as TASM, TBSM, TESM, DMSM, etc., that are difficult to keep straight. DMFA, never really defined, could be dimethyl formamide, but the formula associated with it (p 121), “(CH3)3Nf-C=O-” leaves one to wonder. This review is, on the whole, obscure, confusing, and of little use to the reader in terms of the chemistry that is presented. It is not quite clear whether this is because of the translation or whether it is because the tin chemistry and the science in general that are being proposed are just a bit strange and off-beat. In any case, this chapter decidedly is not a positive contribution to organotin chemistry. Gielen’s chapter, on the other hand, is a valuable contribution. It provides an excellent, authoritative, well-organized and wellwritten (in good English) summary of optically active organotin compounds, a field pioneered by the author of this chapter. He can be faulted on only one point: after stating at the end (p 102), “I have avoided the problem of referring to my research students by name by mentioning none of them; but their experimental work is gratefully acknowledged, and their names can be found in the references below.“, he cites more than a few references to his own work as “Gielen, M. et al.”, thus relegating these coworkers to undeserved anonymity. If this volume is typical of the “Topics in Current Chemistry” series, one must conclude that the series has some problems. Dietmar Seyferth, Massachusetts Institute of Technology