2484
Langmuir 2004, 20, 2484-2488
Hot Filament Chemical Vapor Deposition of Poly(glycidyl methacrylate) Thin Films Using tert-Butyl Peroxide as an Initiator Yu Mao† and Karen K. Gleason*,‡ Departments of Materials Science and Engineering and Chemical Engineering, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139 Received October 17, 2003. In Final Form: December 30, 2003 We have demonstrated the successful deposition of poly(glycidyl methacrylate) (PGMA) thin films using hot filament chemical vapor deposition (HFCVD) with tert-butyl peroxide as the initiator. The introduction of the initiator allows for film deposition at low filament temperatures (
