JUST PUBUSHEft Polymers in Microlithography: Materials and Processes This illuminating new summary reveals recent advances in resist chemistry and processing. An important addition to the literature, Polymers in Microlithography highlights the inter action between fundamental radiation chemistry and its applications to resist materials for optical, electron, and x-ray lithography. Featured are the following timely topics: • chemical amplification resist systems • polymer thin film characterization • image contrast enhancement materials and processes • gas-phase surface functionalization schemes for dry processing • silicon-containing resists for bi-layer lithography
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Twenty-six papers in three main sections cover chemically amplified resist systems, multilevel resist chemistry and processing, and novel chemistry and processes for microlithography. Special emphasis is placed on: • polymer chemistry for resist design and characterization • radiation chemistry of polymers for microlithography • the chemistry of lithographic processes, such as plasma etching and polymer dissolution If you design, synthesize, or characterize resist materials, this book will give you a fully current assessment of your specialty. If you are a development engineer or scientist in the electronics industry, a polymer scientist, photochemist, or radiation chemist, this book offers you the latest advances in one of the most exciting new areas of technology. Eisa Reichmanis, Editor, AT&T Bell Laboratories Scott A. MacDonald, Editor, IBM Almaden Research Center Takao Iwayanagi, Editor, Hitachi Central Research Laboratory Developed from a symposium sponsored by the Division of Polymeric Materials: Science and Engineering of the American Chemical Society. ACS Symposium Series No. 412 435 pages (1989) Clothbound
ISBN 0-8412-1701-7 LC 89-17931 U.S. & Canada $94.95 Export
$113.95
Contents Bronsted Acid Generation · Chemically Amplified Resists · Copolymer Approach to Design of Deep-UV Resist Systems · Nonswelling .Xegative Resists · Acid-Catalyzed Cross-Linking · New Design for Self-Developing Imaging Systems · Polysilanes: Solution Photochemistry & Lithography Syntheses of Base-Soluble Si Polymers · Phenolic Resin-Dimethyl Siloxane Copolymers · Novel Silicone-Based Positive Photoresists · Photooxidation of Polymers · Polymer Etching in an Oxygen Glow Discharge · Laser Interferometer Waveform · Organic Materials as Planarizing Layers · Deep-UV Resist for KrF Excimer Laser Lithography · Thiosulfate Functionalized Polymers · Pyrimidine Derivatives as Lithographic Materials · Metal-Free Diazonium Salts · Photobleaching Chemistry of Polymers Containing Anthracenes · Ultrathin Langmuir-Blodgett Polymer Films · Dissolution of Phenolic Resins and Their Blends · Solvent Concentration Profile of Poly(methyl methacrylate) · Molecular Studies on Laser Ablation Processes · Mechanism of Polymer Photoablation i l - and 11 !\ -Induced Etching of Poly(methyl methacrylate) Ail/ ^ Μ >Polymeric Λ Ι ν η
Materials for Electronics Packaging and Interconnection
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Electronic and Photonic Applications of Polymers
Introduction to Microlithography: Theory, Materials, and Processing Provides useful, basic information on microcircuit processing, lithography, and dry etching. Discusses materials, and processes of lithography. Serves as a semiconductor short course. Essential for electronic engineers, chemists and chemical engineers, materi als scientists, semiconductor technologists, and solid state technologists.
Learn more about the passive and active applica tions that include polymers as resists in microlithog raphy, components of optical recording systems, and uses in nonlinear optics, molecular electronics, and electronic and photonic conduction. Focus on advances in design and application and learn about cutting-edge research in the major areas of polymer resists, photonic applications, polymers in electronic packaging, polymeric materials as substrates and protective layers, and much more.
L.F.Thompson, M.J. Bowden and C.G. Wilson, Editors
Murrae J. Bowden and S. Richard Turner, Editors
ASC Symposium Series No. 219 ISBN 0-8412-0775-5 384 pages (1983) Clothbound US & Canada $49.95 Export $59.95
Advances in Chemistry Series No. 218 ISNB0-8412-1400-X 392 pages (1988) Clothbound US & Canada $94.95 Export $113.95
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Addresses the many aspects relating to the develop ment of novel polymeric materials and processes. The emphasis is on chemistry and materials science, rather than circuitry, its electrical capabilities, or its design changes. Thirty-eight chapters focus on physical chemistry of materials, properties and applications of encapsulants, properties and applica tions of gels, and printed circuit board substrates and materials for circuit board substrates. John H. Lupinski and Robert S. Moore, Editors ACS Symposium Series No. 407 ISBN 0-8412-1679-9 512 pages (1989) Clothbound US & Canada $99.95 Export $119.95
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