Mar 3, 2009 - ... Chicago, Illinois 60614, and Idaho National Laboratory, MS 2211, P.O. Box ... available by participants in Crossref's Cited-by Linking service.
Mar 3, 2009 - particle diameter for spherical clusters or, equivalently, on the inverse of the cube root of the number of particles in the cluster. We have tested ...
Consequently, the design of metal catalyzed C–H bond functionalization .... (31) Cyclohexanone was exclusively obtained at ∼64% conversion; after 10 runs, ..... under homogeneous conditions entail PdNPs as a reservoir of Pd(0) species ..... (a) Hashi
May 30, 2017 - Guoxue Liu , Wei Li , Ran Bi , Christian Atangana Etogo , Xin-Yao Yu , and .... Mahesh Gangishetty , Guangxu Chen , Yawei Zhou , Winfield Hill ...
May 30, 2017 - Rowland Institute, Harvard University, Cambridge, Massachusetts 02142, United ... The CO2-to-CO mechanism and interfacial chemistry are.
3 days ago - She received her Bachelor's degree in Materials Science and Engineering with a specialty of Polymer from Beijing University of Chemical Technology, China, in 2009. Then she received her Ph.D. in Chemistry from Colorado school of Mines in
Dec 19, 2017 - Electrochemical Characteristics of Layered Transition Metal Oxide Cathode Materials for Lithium Ion Batteries: Surface, Bulk Behavior, and Thermal Properties ... Published as part of the Accounts of Chemical Research special issue âE
May 30, 2017 - Guoxue Liu , Wei Li , Ran Bi , Christian Atangana Etogo , Xin-Yao Yu , and Lei ... Peng Han , Zhijie Wang , Min Kuang , Yifei Wang , Jianing Liu ...
www.nano-tech.gatech.edu
Metal Oxide Nanoparticles for High Energy Electrochemical Capacitors - PRF # 49045-DNI10 Gleb Yushin School of Materials Science and Engineering, Georgia Institute of Technology We tune ALD synthesis conditions to uniformly deposit metal oxide nanoparticles or thin films on the surface of porous carbon electrodes
We vary the metal oxides thickness by the number of ALD cycles:
We produce and test supercapacitor devices and reveal structureproperty relationships for the ALD deposited metal oxide films:
