Microelectronics Processing - ACS Publications - American Chemical

AT&T Bell Laboratories. C. M. Roland. US. Naval Research ... collections of data in special areas of topical interest that could not be accommodated i...
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Microelectronics Processing

Hess and Jensen; Microelectronics Processing Advances in Chemistry; American Chemical Society: Washington, DC, 1989.

Hess and Jensen; Microelectronics Processing Advances in Chemistry; American Chemical Society: Washington, DC, 1989.

Downloaded by 183.89.126.20 on April 24, 2018 | https://pubs.acs.org Publication Date: May 5, 1989 | doi: 10.1021/ba-1989-0221.fw001

ADVANCES IN CHEMISTRY SERIES 221

Microelectronics Processing Chemical Engineering Aspects

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Dennis W. Hess, University

of

California-Berkeley

Klavs F. Jensen, University

EDITOR

of

EDITOR

Minnesota

American Chemical Society, Washington, DC 1989

Hess and Jensen; Microelectronics Processing Advances in Chemistry; American Chemical Society: Washington, DC, 1989.

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Library of Congress Cataloging-in-Publication Data Microelectronics Processing: Chemical Engineering Aspects Dennis W. Hess, editor, Klavs F. Jensen, editor p. cm.—(Advances in chemistry series, ISSN 0065-2393; 221) Bibliography: p. Includes index. ISBN 0-8412-1475-1 1. Microelectronics-Materials. 2. Integrated Circuits—Design and Construction. 3. Surface Chemistry. I. Hess, Dennis W. III. Series

II. Jensen, Klavs F., 1952-

TK7874.M4835 1989 621.381-dc19

89-6862 CIP

Copyright © 1989 American Chemical Society All Rights Reserved. The appearance of the code at the bottom of the first page of each chapter in this volume indicates the copyright owner's consent that reprographic copies of the chapter may be made for personal or internal use or for the personal or internal use of specific clients. This consent is given on the condition, however, that the copier pay the stated per-copy fee through the Copyright Clearance Center, Inc., 27 Congress Street, Salem, M A 01970, for copying beyond that permitted by Sections 107 or 108 of the U.S. Copyright Law. This consent does not extend to copying or transmission by any means—graphic or electronic—for any other purpose, such as for general distribution, for advertising or promotional purposes, for creating a new collective work, for resale, or for information storage and retrieval systems. The copying fee for each chapter is indicated in the code at the bottom of the first page of the chapter. The citation of trade names and/or names of manufacturers in this publication is not to be construed as an endorsement or as approval by ACS of the commercial products or services referenced herein; nor should the mere reference herein to any drawing, specification, chemical process, or other data be regarded as a license or as a conveyance of any right or permission to the holder, reader, or any other person or corporation, to manufacture, reproduce, use, or sell any patented invention or copyrighted work that may in any way be related thereto. Registered names, trademarks, etc., used in this publication, even without specific indication thereof, are not to be considered unprotected by law. PRINTED IN THE UNITED STATES OF AMERICA

American Chemical Society Library 1155 16th St., N.W.

Hess andWashington, Jensen; Microelectronics Processing D.C. 20036 Advances in Chemistry; American Chemical Society: Washington, DC, 1989.

Advances in Chemistry Series

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M . Joan Comstock, Series Editor 1989 ACS Books Advisory Board Paul S. Anderson Merck Sharp & D o h m e Research Laboratories

Mary A . Kaiser Ε. I. d u Pont de Nemours and Company

Alexis T. Bell University of California—Berkeley

Michael R. Ladisch Purdue University

Harvey W. Blanch University of California—Berkeley Malcolm H . Chisholm Indiana University Alan Elzerman Clemson University John W. Finley Nabisco Brands, Inc. Natalie Foster Lehigh University Marye Anne Fox The University of Texas—Austin G . Wayne Ivie U S . Department of Agriculture, Agricultural Research Service

John L . Massingill D o w Chemical C o m p a n y Daniel M . Quinn University of Iowa James C . Randall Exxon Chemical Company Eisa Reichmanis A T & T Bell Laboratories C . M . Roland U S . N a v a l Research Laboratory Stephen A . Szabo Conoco Inc. Wendy A . Warr Imperial Chemical Industries Robert A . Weiss University of Connecticut

Hess and Jensen; Microelectronics Processing Advances in Chemistry; American Chemical Society: Washington, DC, 1989.

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FOREWORD The A D V A N C E S I N C H E M I S T R Y S E R I E S was founded in 1949 by the American Chemical Society as an outlet for symposia and collections of data in special areas of topical interest that could not be accommodated in the Society's journals. It provides a medium for symposia that would otherwise be fragmented because their papers would be distributed among several journals or not published at all. Papers are reviewed critically according to ACS editorial standards and receive the careful attention and processing characteristic of ACS publications. Volumes in the A D V A N C E S I N C H E M I S T R Y S E R I E S maintain the integrity of the symposia on which they are based; however, verbatim reproductions of previously published papers are not accepted. Papers may include reports of research as well as reviews, because symposia may embrace both types of presentation.,

Hess and Jensen; Microelectronics Processing Advances in Chemistry; American Chemical Society: Washington, DC, 1989.

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Lawrence A. Casper, Honeywell,

SPECIALTY E D I T O R

Inc.

This book was acquired for publication through the efforts of Lawrence A. Casper acting in behalf of the American Chemical Society as a Specialty Editor. Dr. Casper developed the concept for this book and assisted in the content development and manuscript review.

Hess and Jensen; Microelectronics Processing Advances in Chemistry; American Chemical Society: Washington, DC, 1989.

Hess and Jensen; Microelectronics Processing Advances in Chemistry; American Chemical Society: Washington, DC, 1989.

Downloaded by 183.89.126.20 on April 24, 2018 | https://pubs.acs.org Publication Date: May 5, 1989 | doi: 10.1021/ba-1989-0221.fw001

ABOUT T H E EDITORS W.

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DENNIS

H E S S is a professor of c h e m i c a l

e n g i n e e r i n g at the U n i v e r s i t y of C a l i f o r n i a B e r k e l e y . H e r e c e i v e d his B . S . i n c h e m i s t r y from A l b r i g h t C o l l e g e a n d the M . S . a n d P h . D . in physical chemistry from L e h i g h University. F r o m 1973 to 1977, he p e r f o r m e d basic a n d a p p l i e d research i n m i c r o e l e c t r o n i c - d e v i c e fabr i c a t i o n at F a i r c h i l d S e m i c o n d u c t o r . S i n c e 1977, he has b e e n o n the faculty at the U n i versity of C a l i f o r n i a , B e r k e l e y , w h e r e he served as assistant dean of the C o l l e g e of C h e m i s t r y from 1982 to 1987 a n d as acting vice c h a i r m a n of the D e p a r t m e n t of C h e m i c a l E n g i n e e r i n g from A u g u s t to D e c e m b e r 1988. H e was a v i s i t i n g professor at the U n i v e r s i t y of M i n n e s o t a d u r i n g the 1983-1984 academic year. H e was c h a i r man of the 1988 G o r d o n C o n f e r e n c e o n the C h e m i s t r y of E l e c t r o n i c M a terials. H i s research interests are i n the areas of t h i n - f i l m science a n d technology, p l a s m a c h e m i s t r y , a n d plasma physics. H e is the author a n d coauthor of o v e r 90 t e c h n i c a l publications. H e is a d i v i s i o n a l editor for the Journal of the Electrochemical Society a n d an associate editor for Chemistry of Materials. K L A V S F. J E N S E N is a professor of

chemical

e n g i n e e r i n g a n d materials science a n d a fellow of the S u p e r c o m p u t e r Institute at the U n i v e r sity of M i n n e s o t a . H e r e c e i v e d his u n d e r g r a d uate education at the T e c h n i c a l U n i v e r s i t y of D e n m a r k a n d his P h . D . from the U n i v e r s i t y of W i s c o n s i n - M a d i s o n . H e has b e e n a v i s i t i n g professor at the I B M T. J . W a t s o n R e s e a r c h C e n t e r , Massachusetts Institute of T e c h n o l ogy, a n d the T e c h n i c a l U n i v e r s i t y of A a c h e n . H i s research interests revolve around the c h e m i s t r y of a n d transport p h e n o m e n a related to electronic materials processing, i n c l u d i n g (1) organometallic c h e m i c a l vapor deposition of t h i n films; (2) p l a s m a a n d laser processing of t h i n films, i n c l u d i n g m e t a l - p o l y m e r interfaces; (3) large-scale simulations of c h e m i c a l l y reacting flows; (4) dynamics of c h e m i c a l l y reacting ix

Hess and Jensen; Microelectronics Processing Advances in Chemistry; American Chemical Society: Washington, DC, 1989.

Downloaded by 183.89.126.20 on April 24, 2018 | https://pubs.acs.org Publication Date: May 5, 1989 | doi: 10.1021/ba-1989-0221.fw001

systems; a n d (5) reaction a n d transport i n porous m e d i a . H e is the coauthor of m o r e than 80 t e c h n i c a l publications a n d has b e e n a p l e n a r y l e c t u r e r at international conferences o n the processing of electronic materials. H e is the r e c i p i e n t of the 1982 E l e c t r o c h e m i c a l Society Y o u n g A u t h o r s ' A w a r d i n solid-state science and technology and the 1984 N a t i o n a l Science F o u n d a t i o n P r e s i d e n t i a l Y o u n g Investigator A w a r d . I n a d d i t i o n , he r e c e i v e d a C a m i l l e a n d H e n r y D r e y f u s F o u n d a t i o n T e a c h e r - S c h o l a r G r a n t (1985), a G u g g e n ­ h e i m F e l l o w s h i p (1987), a n d the A l l a n P. C o l b u r n A w a r d of the A m e r i c a n Institute of C h e m i c a l E n g i n e e r s (1987).

χ Hess and Jensen; Microelectronics Processing Advances in Chemistry; American Chemical Society: Washington, DC, 1989.