LETTER pubs.acs.org/NanoLett
Neon Ion Beam Lithography (NIBL) Donald Winston,†,§ Vitor R. Manfrinato,†,§ Samuel M. Nicaise,†,§ Lin Lee Cheong,†,§ Huigao Duan,†,|| David Ferranti,‡ Jeff Marshman,‡ Shawn McVey,‡ Lewis Stern,‡ John Notte,‡ and Karl K. Berggren*,† † ‡
Massachusetts Institute of Technology, Cambridge, Massachusetts 02139, United States Carl Zeiss NTS, LLC, Peabody, Massachusetts 01960, United States
bS Supporting Information ABSTRACT: Existing techniques for electron- and ion-beam lithography, routinely employed for nanoscale device fabrication and mask/mold prototyping, do not simultaneously achieve efficient (low fluence) exposure and high resolution. We report lithography using neon ions with fluence
