Downloaded by 80.82.77.83 on April 25, 2017 | http://pubs.acs.org Publication Date: October 31, 1989 | doi: 10.1021/bk-1989-0412.ix001
Author Index Baiocchi, Frank Α., 188 Ban, Hiroshi, 174 Berry, A. K., 85 Bogan, L. E., Jr., 85 Clecak, N., 114 Dems, B. C , 233 Downing, J., 114 Ebina, Mayumi, 56 Endo, Masayuki, 266 Fahey, J., 99 Frank, C. W., 346 Fréchet, Jean M. J., 73,99 Fukumura, Hiroshi, 397 Granier, Vincent, 408 Graziano, IC Α., 85 Hashimoto, Michiaki, 316 Hayase, Shuzi, 132 Horiguchi, Rumiko, 132 Houlihan, Francis M., 38 Hoyle, C. E., 277 Huang, J. P., 361 Hutchens, D. E., 277 Igarashi, K., 99 Iizawa, T., 99 Imamura, Saburo, 174 Inaki, Yoshiaki, 300 Itaya, Akira, 397 Ito, Hiroshi, 56 Iwayanagi, Takao, 316 Jurek, M. J., 157 Jurgensen, Charles W., 209 Karatsu, T., 114 Klingensmith, Κ. Α., 114 Kosbar, L. L., 346 Krasicky, P. D., 233 Kuan, S. W. J., 346 Kwei, T. K., 361 Lazare, Sylvain, 408 Limm, William, 382 MacDonald, Scott Α., 26 Martin, P. S., 346 Masuhara, Hiroshi, 397 Matuszczak, Stephen, 73
Matuszczak, Stephen, 73 McKean, D. R., 26 McKinley, A. J., 114 Michl, J., 114 Miller, R. D., 114 Mitsuhata, Tsuneo, 421 Moghaddam, Minoo Jalili, 300 Nalamasu, Omkaram, 188 Nishikubo, T., 99 Nomura, Noboru, 266 Onishi, Yasunobu, 132 Pearce, Ε. M., 361 Pease, R. F. W., 346 Reck, Berndt, 73 Reichmanis, Eisa, 1,38,157 Reiser, Α., 361 Rodriguez, F., 233 Sasago, Masaru, 266 Schaedeli, U., 26 Sheats, James R., 329 Smith, Barton Α., 382 Sooriyakumaran, R., 114 Stanton, Deirdre T., 382 Stillwagon, L. E., 251 Stôver, Harald D. H., 73 Sugita, Kazuyuki, 421 Takemoto, Kiichi, 300 Tanaka, Akinobu, 174 Tanaka, Kenichiro, 421 Tani, Yoshiyuki, 266 Tarascon, Régine G., 38 Taylor, Gary N., 188,251 Thackeray, J. W., 85 Thames, S. F., 277 Thompson, Larry F., 1,38 Uchino, Shou-ichi, 316 Ueda, Mitsuru, 56 Ueno, Nobuo, 421 Ushirogouchi, Tom, 132 Wallraff, G., 114 Willson, C Grant, 73,99 Winnik, Mitchell Α., 382
438
Reichmanis et al.; Polymers in Microlithography ACS Symposium Series; American Chemical Society: Washington, DC, 1989.
439
INDEX
Downloaded by 80.82.77.83 on April 25, 2017 | http://pubs.acs.org Publication Date: October 31, 1989 | doi: 10.1021/bk-1989-0412.ix001
Affiliation Index AT&T Bell Laboratories, 1,38,157,188,209,251 Chiba University, 421 Cornell University, 73,99,233 Hewlett Packard Laboratories, 329 Hitachi Ltd., 316 IBM Almaden Research Center, 26,56,73,99,114,382 Kanagawa University, 99 Kyoto Institute of Technology, 397 Matsushita Electric Industrial Company Ltd., 266 National Laboratory for High-Energy Physics, 421 NTT Basic Research Laboratories, 174
NTT LSI Laboratories, 174 Osaka University, 300 Polytechnic University, 361 Rohm and Haas Company, 85 Shipley Company, Inc., 85 Stanford University, 346 Toshiba Corporation, 132 U.S. Army, 382 Université de Bordeaux I, 408 University of Southern Mississippi, 277 University of Texas at Austin, 114 University of Toronto, 382 Yamagata University, 56
Subject Index
Ablation rate constant definition, 418 determination, 414,417* Ablative photodecomposition description, 411 See also Photoablation Acetylated m-cresol-novolac copolymers, preparation, 193 Acetylated poly(phenylsilsesquioxane) characterization, 176-177 molecular structure determination, 176 Si-NMR spectra, 176,178/ synthesis, 176 Acid analysis, merocyanine dye methods, 30^1/33/ Acid-catalyzed photoresist films acid diffusion, 35 acid generation, 30,32,33/34* advantages, 28 catalytic chain length, 34,35* development of classes of cationic photoinitiators, 28 experimental procedure, 35-36 generation mechanism from irradiation of triphenylsulfonium salts, 28-29 merocyanine dye method for acid analysis, 30,31/33/ use of ierr-butoxycarbonyl functionality as protecting groups, 28,31 Acid diffusion, determination for acid-catalyzed photoresistfilms,35 29
Acid generation in photoresist films acid photogeneration vs. dose, 32,33/ acid present after irradiation, 32,34* acid present before irradiation, 32 quantum yield, 32,34 Acid hardening resin resists cross-linking activation energy determination, 87,89 cross-linking chemistry, 87 determination of acid generated, 87-88 effect of postexposure bake temperature and time, 87 Activation energy of cross-linking, determination for novolac-based negative resists, 90,93,94/95* Active polyformals first-order dependence of acidolysis, 106,108/· preparation under phase-transfer catalysis, 104,106*,107-108f scanning electron micrograph of self-developed image, 109,1 lOf schematics of imaging process, 106,10^,109 thermogravimetric analysis, 106,107/ UV absorbance vs. time during acidolysis, 106,107/ Alkali-developable silicon-containing positive photoresists, development, 175 Alkoxysilanes, polymerization, 134,136,142* Allylic ethers and polyethers, thermolytic cleavage, 103,104,105/
Reichmanis et al.; Polymers in Microlithography ACS Symposium Series; American Chemical Society: Washington, DC, 1989.
