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Simultaneous Graphite Exfoliation and N Doping in Supercritical Ammonia Suchithra Padmajan Sasikala,† Kai Huang,‡ Baptiste Giroire,† Prem Prabhakaran,§ Lucile Henry,† Alain Penicaud,‡ Philippe Poulin,*,‡ and Cyril Aymonier*,† †
ICMCB, UPR 9048 and ‡CRPP, UPR 8641; CNRS, University of Bordeaux, F-33600 Pessac, France Department of Advanced Materials, Hannam University, Daejeon 305-811, South Korea
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S Supporting Information *
ABSTRACT: We report the exfoliation of graphite and simultaneous N doping of graphene by two methods: supercritical ammonia treatment and liquid-phase exfoliation with NH4OH. While the supercritical ammonia allowed N doping at a level of 6.4 atom % in 2 h, the liquid-phase exfoliation with NH4OH allowed N doping at a level of 2.7 atom % in 6 h. The N doped graphene obtained via the supercritical ammonia route had few layers (
