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Spring-like pseudo-electroelasticity of monocrystalline Cu2S nanowire Qiubo Zhang, Zhe Shi, Kuibo Yin, Hui Dong, Feng Xu, Xinxing Peng, Kaihao Yu, Hongtao Zhang, Chia-Chin Chen, Ilia Valov, Haimei Zheng, and Litao Sun Nano Lett., Just Accepted Manuscript • DOI: 10.1021/acs.nanolett.8b01914 • Publication Date (Web): 02 Jul 2018 Downloaded from http://pubs.acs.org on July 2, 2018
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Spring-like pseudo-electroelasticity of
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monocrystalline Cu2S nanowire
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Qiubo Zhang†‡#, Zhe Shi§#, Kuibo Yin†, Hui Dong†, Feng Xu†, Xinxing Peng‡, Kaihao Yu†,
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Hongtao Zhang†, Chia-Chin Chen||, Ilia Valov *, Haimei Zheng‡∇* and Litao Sun†
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SEU-FEI Nano-Pico Center, Key Laboratory of MEMS of Ministry of Education, Collaborative Innovation Center for Micro/Nano Fabrication, Device and System, Southeast University, Nanjing 210018, P. R. China. Materials Science Division, Lawrence Berkeley National Laboratory, Berkeley, California 94720, United States Department of Materials Science and Engineering, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139, United States Max Planck Institute for Solid State Research, Heisenbergstr.1, 70569 Stuttgart Germany
Research Centre Juelich, Peter Gruenberg Institute, Electronic Materials, 52425 Juelich, Germany Department of Materials Science and Engineering, University of California, Berkeley, California 94720, United States Center for Advanced Materials and Manufacture, Joint Research Institute of Southeast University and Monash University, Suzhou 215123, P. R. China
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ABSTRACT: Prediction from the dual-phase nature of superionic conductors – both solid and
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liquid-like – is that mobile ions in the material may experience reversible extraction-reinsertion
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by an external electric field. However, this type of pseudo-electroelasticity has not been
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confirmed in situ and no details on the microscopic mechanism are known. Here, we in situ
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monitor the pseudo-electroelasticity of monocrystalline Cu2S nanowires (NWs) using
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transmission electron microscopy (TEM). Specifically, we reveal the atomic scale details
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including phase transformation, migration and redox reactions of Cu+ ions, nucleation and
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growth, as well as spontaneous shrinking of Cu protrusion. Caterpillar-diffusion-dominated
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deformation is confirmed by the high-resolution transmission electron microscopy (HRTEM)
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observation and ab initio calculation, which can be driven by either an external electric field or
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chemical potential difference. The observed spring-like behavior was creatively adopted for
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electric nanoactuators. Our findings are crucial to elucidate the mechanism of pseudo-
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electroelasticity and could potentially stimulate in-depth research into electrochemical and
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nanoelectromechanical systems.
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KEYWORDS: In situ TEM, pseudo-electroelasticity, Cu2S nanowire, electrochemical,
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superionic conductor.
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Superionic conductors possessing both rigid solid and fluidic liquid sublattices1 can offer special
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applications in energy conversion2-5, memristive systems6, 7, and crystal growth8. A characteristic
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feature of the dual-phase nature is that the mobile ions occupying the fluidic sublattice may be
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extracted out of their sublattice under an application of electric field, and be spontaneously re-
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inserted into the material upon removal of the electrical bias, driven by chemical potential
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gradient. This process, known as the “pseudo-electroelasticity”, is essential for unveiling the
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microscopic working mechanisms responsible for various functional superionic conductors and
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remains challenging to identify and characterize experimentally.
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Valuable works have been conducted to study the microscopic mechanism of redox reactions,
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ion transport and mass transfer in various superionic conductors5-16. For example, Valov et al
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studied the atomical nucleation at superionic solid electrolyte surface12. Takeo Ohno et al studied
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the short-term plasticity and long-term potentiation in mixed electronic-superionic inorganic
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synapses6. Chia-Chin Chen et al studied the ultrafast silver mass storage and removal in mixed
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conductors5. However, a wide range of microscopic processes are so far still elusive including
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the diffusion of mobile species during the growth and dissolution processes of the metal
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protrusion is not evidently revealed12, 13, 17, the corresponding relation between measured total
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current and atoms/ions movement remains to be characterized14, 17, and the long-term stability of
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protrusion after gap bridged is yet to be confirmed by imaging6, 12, 13.
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One bottleneck of the in situ study of such process is the difficulty of facilitating ion transport
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pathways in typical materials. To alleviate this problem, the material system of monocrystalline
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Cu2S nanocrystals came into our attention. Our previous work proved that the Cu2S can be heat-
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treated to undergo a phase transformation from low chalcocite (LC) to high chalcocite (HC) near
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room temperature18, 19, and the HC phase exhibits superionic properties with its S atoms forming
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a rigid sublattice and Cu atoms randomly jumping around similar to a liquid1. This allows
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chemical potential gradient and external electric field to easily drive the mobilizing Cu+ ions in
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and out of their sublattice, opening up a large window to observe pseudo-electroelasticity under
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an STM-TEM system. We were thus able to monitor the whole pseudo-electroelasticity process
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including LC-to-HC phase transformation, migration and jamming of Cu+ ions, nucleation and
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growth, as well as spontaneous shrinking of Cu protrusion.
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Result and Discussion.
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Figure 1. Pseudo-electroelasticity deformation of Cu2S NWs. (a) Schematic illustration of the in
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situ experimental setup. In the experimental setup, the Cu2S NW was supported on a half-Au
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grid and the other end contacted to a grounded W tip, both working as chemical inert electrodes.
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(b) Current vs. time and length vs. time curves are recorded during the pseudo-electroelasticity
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process. The applied voltage for ion extrusion is 0.5 V lasting 60 s and 0 V for the insertion
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process. Error bars indicate the standard deviation. (c-l) Snapshots of the pseudo-electroelasticity
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process demonstrating Cu protrusion growth and dissolution. The Cu2S NW has an initial length
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of 420 nm (almost recovered with a final length of 400 nm) and diameter of 38 nm (unchanged).
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Scale bars, 200 nm. (m) Schematics of the extrusion and re-insertion process. The NW is divided
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into two parts: one part (P1) loaded on the gold grid acts as a Cu+ ion reservoir and the other part
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projecting out of the grid (P2) is mainly used for the transmission of Cu+ ions. During extrusion
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process, the Cu+ ions in P2 are driven out of their regular positions, while the Cu+ ions in P1
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migrate into P2 to fill the Cu+ ion vacancies. The extruded Cu+ ions are blocked/oxidized at the
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Cu2S/W interface and are pushed forward by the new oxidized Cu atoms. During re-insertion
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process, the Cu+ ions in P2 migrate back into P1 and following the extruded Cu+ ions move back
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into P2. The blue and red arrows refer to the extrusion and re-insertion process, respectively.
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In our experiment, we constructed a close-circuit electrochemical system with a monocrystalline
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LC-phase Cu2S NW (Figure S1) incorporated between Au and W ends, as shown in Figure 1a. A
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bias was applied to induce NW pseudo-electroelasticity (Video 1). During the whole process, the
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loop current in the circuit as well as the length of the prolongation were recorded in real time
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(Fig. 1b). For the interval from 0 s to 60 s, the sampling rate is two samples per second. While
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for the interval from 60 s to 143 s, the circuit is disconnected leading to the loop current is zero.
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In order to accurately measure the length of precipitated copper, we select the sampling points
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corresponding to the clear images in the video, and the intervals between two sampling points are
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not constant. According to the current vs. time and the length vs. time curves, the process can be
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divided into four steps: initial state (c-d), electrochemical extraction (d-g), dynamic equilibrium
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(g-h), and reverse incorporation (h-l).
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During the initial state, the NW is unchanged and the loop current is close to zero. After the first
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26 s, the electrochemical extraction (formation of Cu phase) took place quickly, and the length of
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the formed Cu nanowire reached its maximum at 30 s (Figure 1g). The total current (26 s-30 s)
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drastically shoot up to ~1000 nA. The maximum conductivity of the Cu2S during dynamic
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extrusion state was estimated to be ~103 Siemens/m, consistent with the experiment values
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reported in the literature20 (Supplementary Text). After this increase, the NW system turned into
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a dynamic equilibrium state until the end of biasing at 60 s (Figure 1h), the current intensity
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drops to about several tens of nanoamperes and no further growth of the Cu nanowire was
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observed. A series of characterizations (Figure S2 & S3) verifying the Cu extraction are included
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in Supplementary Text. After biasing, the electrochemically formed Cu protrusion dissolves back
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into NW spontaneously in a self-induced way. Meanwhile, the Cu NW is detached from the W
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tip, and the electric circuit cuts off automatically. The rate of Cu dissolution reduces with time
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(Figure 1h-l), reflected from the curvature of the length-time dependence curve in Figure 1b. In
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the end, the protrusion is dissolved almost completely, the shape and the structure of Cu2S NW
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returned to its initial dimensions (Figure 1l, Figure S4). The slightly reduced length is caused by
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the difference of the projection directions.
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Figure 2. Microstructure evolution of the NW during the pseudo electroelasticity process. (a-d)
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Top: TEM images of one Cu2S NW during the extrusion process at different times; bottom:
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HRTEM images of the corresponding red dot square areas (left) and corresponding FFT patterns
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(right). (e) Line profiles of FFT patterns along the [100] direction of S sublattice ([102] direction
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of the LC or [100] direction of HC) showing phase evolution. (f) Atomic structure of HC phase
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Cu2S. Four different Cu sites are marked in green, with the fraction of color showing the
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fractional occupancy of the respective site. Highlighted are the Cu atoms in the 2b site (the most
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probable site) participating in the c channel migration. (g) The energy landscape of concerted
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migration of Cu 2b atoms along the c channel (shown in inset). (h-k) Top: TEM images of one
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Cu2S NW during the insertion process; bottom: HRTEM images of the corresponding blue dot
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square areas (left) and corresponding FFT patterns (right), with the Cu2S, Cu protrusion, and W
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tip highlighted in golden, green and blue, respectively. The weak contrast of blue part in (a-d) is
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amorphous carbon coating on W tip which does not influence the experiment.
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To understand the detailed migration behavior of Cu+ ions within the Cu2S NW, a series of
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HRTEM images were recorded, as shown in Figure 2. The corresponding raw HRTEM images
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are listed in Figure S5&6. Starting with biasing the pristine NW for 1.5 seconds, the LC structure
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completely turned into HC accompanied by the disappearance of the stacking faults (Figure 2b).
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The phase transition is caused by Joule heating1, 18. When constant bias is applied, the Cu2S
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NW’s temperature will rise due to Joule heating until reaching a thermal equilibrium state21. We
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simulated the temperature distribution of a Cu2S NW in thermal equilibrium state by finite
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element method (Figure S7) and found that the temperature raised by Joule heating is enough to
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induce phase transition1,
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transformation originates at the stacking faults and propagates from the edge inward until the LC
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structure is completely converted into HC (Figure S8), which is consistent with our previous
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work18. Subsequently, the Cu atoms begin to nucleate at the tip of the NW (highlighted in green),
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and the NW maintain the HC phase during the dynamic extrusion process, as shown in Figure 2c
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and Video 2. The HRTEM image in Figure 2d confirms that the protrusion is entirely made of
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metallic copper as confirmed from the spacing of the lattice fringes, which agrees with that of
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The detailed phase transition path shows that the phase
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{111}-Cu planes. Figure 2e reveals that the [102] diffraction spot of the LC disappears after 1.5
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seconds, which indicates the complete conversion to the HC phase.
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The process of Cu re-insertion (Figure 2h-k) is much simpler. With the bias turned off, HC phase
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converts back to the LC. Surprisingly, the Cu2S NW keeps LC phase during the entire Cu
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insertion process as shown in the FFT patterns of Figure 2h–k. It is shown in Figure 2f-g that
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Cu+ ions migrate along the c channel in a synchronized way (caterpillar migration) with an
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energy barrier of less than 0.6 eV. On the contrary, we find that the isolated motion of a single
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ion along the c channel is not feasible as it encounters huge repulsion from its neighboring ions
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along the c channel and bounces back to the initial configuration prior to the hop. Combing in
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situ HRTEM observations with ab initio calculations, we concluded that the Cu+ ion diffusion in
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this case follows the caterpillar diffusion mechanism22, 23 rather than by independent ion motion
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normally observed in most of the metal-halogen superionic conductors1.
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The different steps in the deformation process are described a brief manner in Figure 1m. First,
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the temperature of the Cu2S NW increases due to Joule heating. Next, a crystallographic phase
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transition occurs during which, Cu+ ions in P2 are driven out of their sublattice, replaced by Cu+
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ions from P1. The extruded Cu+ ions are reduced (precipitate) at the W electrode. These atoms
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are pushed forward by the newly reduced Cu atoms and thus the NW is elongated. Once the bias
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is turned off, the extracted Cu atom oxidize and move in the reverse direction, back into the NW.
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The reversible change both in shape and crystal phase was analogous to the deformation of a
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nanospring. However, in our case this deformation of NW is excited by electric field rather than
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by external mechanical force. Despite the complexity of the observed elongation-shortening
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process, we demonstrate in our work that the extrusion of the Cu NW is an electrically driven
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process, and that dissolution process is spontaneous. It is worth emphasizing that the process
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observed in this study is different in nature from other reversible metal extraction-insertion
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phenomena published hitherto16, 24 (Table S1), details see Supplementary Text.
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Figure 3. Dynamics of the pseudo-electroelasticity process. (a) Schematic description of the
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forces acting on the Cu+ ions. The electrochemical driving force (FEC) is a combination of both
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chemical driving force (FC) and the electrical driving force (FE), FEC=FE+FC. (b) The relaxation
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time of Cu extrusion and the projected areas of protrusions at 30 s vary with the applied voltages.
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(c) Schematic diagrams showing the force analysis of four different boundary states in the whole
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process. (d) The corresponding electron electrochemical potential distribution in the four
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different states. Electrochemical potential (μ ) equals the sum of electrical potential (φ) and
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chemical potential (μ). The vertical arrows indicate the shift of the equilibrium and the horizontal
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arrows indicate the direction of the external electric field (ξ).
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In order to explain the experimental phenomena and the corresponding current curves, we have
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considered the Au-Cu2S(Cu)-W structure as solid-state electrochemical system with an ion
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blocking electrode (Au) and reversible W electrode. In this model (Figure 3a), we assume that
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the force created by the external electric field acting on Cu+ ions represents FE and all the other
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effects due to the movement of Cu+ ions are cumulatively included in FC. On the microscopic
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level, four discernible states account for the extrusion and insertion of the Cu protrusion as well
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as the corresponding changes in the distribution of the electrochemical potential of electrons, as
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illustrated in Figure 3.
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Once the Au-Cu2S-W system is connected, the electrochemical potential μ of the system
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equilibrate and the condition μ(
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and Figure 3d (I). The difference in the work functions of Au and Cu2S suggest the formation of
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a Schottky contact at the Au-Cu2S interface as shown in Figure 3d (I). This is why the initial
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loop current is close to zero in Figure 1b.
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An applied voltage shifts the Fermi level of the Au electrode relative to the Cu2S (ΔEF(Au)=eΔφ)
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and an effective electrical potential difference (eφ) is induced, where e is charge of the electron,
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and φ is the local electrostatic potential. According to the energy band diagram of the Au-Cu2S-
) = μ(Cu2S) = μ(W) is fulfilled as shown in Figure 3c (I)
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W system (Figure S9), we know that the major potential drop is concentrated between Au and W
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electrodes as shown by the red line in Figure 3d (Ⅱ). With external voltage exerted upon the
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Cu2S, the mobile Cu+ ions would respond by moving with a drift mobility,
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an equal amount of electrons moving from Au electrode to W electrode through the external
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circuit leads to a formation of positive charges at Au side of the Au/Cu2S interface. In this way,
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an electrical double layer is established at the Au/Cu2S interface to maintain the charge balance
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of the system. It is the electrical double layer that stabilizes the Cu+-deficient material. For the
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electrons arriving at the Cu2S/W interface from the W electrode with energy (EI) higher the
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Fermi energy of the redox reaction, that is, EI > EF (Cu+/Cu), can contribute to the
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electrochemical Cu+/Cu half-cell reaction12. Meanwhile, the activity of Cu is reduced at the
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Au/Cu2S interface (Figure 3c (Ⅱ)) in accordance to the Nernst equation. The observed high
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current (Figure 1B) is a proof of the mass/ion transfer in the Cu2S NW and interface electrode
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reactions. The ionic conduction is estimated in the order of σion= (10 –102) σe (Supplementary
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Text).
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The extraction of Cu from the solid electrolyte will lead to a shift of the chemical potential from
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the green line in Figure 3d(Ⅱ) to the green line in Figure 3d(Ⅲ). When it reaches the level
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denoted by the green line in Figure 3d(Ⅲ), equilibrium will be established as shown in Figure 3c
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(Ⅲ). In this case, the chemical potential gradient formed during the application of voltage drives
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a chemical dissolution process of Cu back into Cu2S matrix, the directional migration of Cu+ ions
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stops, so the ionic conduction no longer contributes the loop current. In addition, the extrusion of
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Cu+ ions induces cationic vacancies on the Cu2S side near the Au/Cu2S interface that provide an
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additional potential, reducing both the built-in potential and the depletion width to maintain the
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Fermi energy balance between Au and Cu2S21, 25. Therefore, the Schottky barrier at the Au/Cu2S
. At the same time,
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interface reduces. This is why the current drops to about several tens of nanoamperes during
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dynamic equilibrium state, which is much smaller than the current in electrochemical extraction
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process but higher than the current in the initial state.
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Upon removal of bias, the extracted Cu starts to be oxidized and dissolved back into the NW,
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driven by chemical potential gradient (higher copper concentration towards the W tip side), as
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shown in Figure 3c (Ⅳ). The Cu species will gradually become uniformly spanned inside the
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NW again, and the chemical potential distribution is shifted from the green line in Figure 3d (Ⅳ)
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to the green line in Figure 3d (I). Obviously, the dissolution of Cu protrusion is slower than the
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growth, which is because of the electronic conductivity is smaller than the ionic conductivity in
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Cu2S in Figure 1b. During electrochemical extraction process, the Cu+ ions diffusion through
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Cu2S NW and the electrons transfer through the external circuit, so the Cu protrusion formation
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process is ionic conduction limiting5. While for Cu dissolution process, the electric circuit cuts
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off after bias, so electrons only can transfer through Cu2S NW, the Cu protrusion dissolution
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process becomes electronic conduction limiting5.
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The value of the applied voltage also influences the process of Cu extraction (Figure S10).
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Constant voltages of variable amplitudes (0 V –1 V, the interval is 0.1 V) were applied on the
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NW, the time of Cu+ ions to begin moving out and the projected areas of Cu protrusions at 30 s
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were recorded as shown in Figure 3b. Based this on data, the phenomenon of pseudo-
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electroelasticity can be divided into three categories. It is worth mentioning that the voltage
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ranges of these three categories varied for different NWs. For a specific NW, the process of Cu+
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ion precipitation has two critical voltages V1 and V2 (Figure 3b). There is a positive correlation
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between the temperature and the applied voltage, since increasing the applied voltage will raise
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the steady-state temperature of the NW. If the bias is below V1, the electric force on the ion is
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not sufficient to overcome the Cu+ ion reduction and diffusion barriers in LC Cu2S and also, the
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steady-state temperature of the NW is below the phase transition temperature, which means that
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the Cu+ ions will not precipitate out of the NW. When the bias is between V1 and V2, the
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electrical field in this case, is also not sufficient to overcome the Cu+ ion reduction/diffusion
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barrier in LC Cu2S, but the steady-state temperature of the NW can increase to above the phase
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transition temperature, in which case, Cu+ ions can become mobile in HC Cu2S. Thus, the
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relaxation time required to induce precipitation of Cu+ ions reduces with increasing applied
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voltage. The measured projected areas of the Cu protrusions at 30 s increase with voltage in this
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range of applied voltage (Figure S10b-d). Above V2, the electrical field force is sufficient to
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overcome the Cu+ ion reaction/diffusion barriers in LC Cu2S and Cu ions instantaneously are
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electrochemically extracted from the NW following applied bias. In this case, the projected area
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of the Cu protrusions at 30 s increases with voltage except for 0.8 V, because the protrusion is
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overlapped in Figure S10f.
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Figure 4. Single nanowire electric nanoactuator. (a) Sequential images showing the whole
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process of a Cu2S nanoactuator. During 1V biasing, the W tip is pushed away by the protrusion
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formed by extruded Cu. After biasing, the Cu2S NW constricts spontaneously and the W tip
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returns to its original position (Video 3). So the Cu2S NW can be used as a nanoactuator to drive
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reciprocating motion of an object. The golden color highlights the Cu2S; the green color
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highlights Cu protrusion and the blue color highlights W tip. (b) The change in the relative
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distance marked by red two-way arrow (from W tip to Cu/Cu2S interface) and angle marked by
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two blue arrows in (a) during the pseudo-electroelasticity process. (c) Repeatability of a
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nanoactuator behavior.
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Lastly, we demonstrate the use of the pseudo-electroelasticity behavior of Cu2S in a linear
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electric nanoactuator (Figure 4). In this way, we can directly convert electrical energy into
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mechanical energy, which can be used to drive the reciprocating motion of an object (Video 3).
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We chose the interface of Cu/Cu2S interface of the NW as reference position. At a bias of 1 V,
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the Cu+ ions move out and push the W tip out. If the bias is turned off, the extruded Cu+ inserts
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back into the NW and pulls the W tip to its original location (Figure 4a). The relative positions
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and the relative change in the orientation of the W tip are presented in Figure 4b. We have
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repeated the actuation process many times for another NW and found that the movement of the
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nanoactuator was precisely repeated, confirming the reliability of the system (Figure 4c and
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Video 4).
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Conclusion. In summary, we directly monitored the pseudo-electroelasticity process of Cu2S
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NWs at atomic scale and have successfully applied this mechanism to nanoelectromechanical
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systems. The details of the electrochemical dynamics are revealed which include, Cu2S phase
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transformation, migration and jamming of Cu+ ions, nucleation and growth, as well as
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spontaneous shrinking of Cu protrusion. The microscopic mechanism convincingly demonstrates
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that the extraction of Cu+ ions is driven by the external electric field and the cation diffusion
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barriers are dominated by Joule heat, whereas the oxidation and re-insertion of Cu in the absence
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of bias is due to the chemical potential difference. Our results open a new perspective about the
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properties of superionic conductor and provide critical insight into the microscopic mechanisms
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of ion transport, thereby motivate further research to broaden this concept in electrochemical and
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nanoelectromechanical systems.
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ASSOCIATED CONTENT
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Supporting Information.
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The supplementary text include synthesis of Copper(I) sulfide NWs, set up of the in situ TEM
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experiment, characterization method and electrical measurements, first-principles calculations,
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simulation of temperature gradient, conductivity measurements, determination of the structure of
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the protrusion formed under bias, the source of extruded Cu ions. Figures include structural
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characterization and Elemental composition of samples and the protrusion, the raw HRTEM
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images corresponding to Figure 2, temperature distribution of Cu2S NW, the phase transition
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trajectory from LC to HC during the extrusion process, the energy band diagram of the
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Au/Cu2S/W structure, the influence of voltage on the Cu extrusion process. Table S1 show the
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analysis of device structure, elasticity or plasticity, dominant ions source, position of extrusion
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and dominant driving force in different kinds of reversible metal extrusion-insertion processes.
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(PDF)
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Electric field induced pseudo-electroelasticity deformation of one Cu2S nanowire, where the extrusion of the Cu NW is an electrically driven process, and that dissolution process is spontaneous. (AVI)
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The extrusion process of the Cu NW at high resolution. (AVI)
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One Cu2S nanowire works as a nanoactuator to drive reciprocating motion of an object (here is W tip). (AVI)
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Repeatability of a nanoactuator behavior. (AVI)
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AUTHOR INFORMATION
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Corresponding Author
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*E-mail:
[email protected]; * E-mail:
[email protected]; *E-mail:
[email protected] 326
Author Contributions
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The manuscript was written through contributions of all authors. All authors have given approval
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to the final version of the manuscript. #These authors contributed equally. Q. Z., L. S. and H. Z.
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conceived the project. Q. Z. performed the in situ TEM imaging. Q. Z., I. V., C. C. and K. Y.
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carried out the data analysis. Z. S. performed the calculations. Q. Z., I. V., H. Z. and L. S. co-
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wrote the paper with all authors contributing to the discussion and preparation of the manuscript.
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Funding Sources
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This work was supported by the National Key R&D Program of China (No. 2017YFA0204800)
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and the National Natural Science Foundation of China (Nos 51420105003, 11327901, 11525415,
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11674052).
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ACKNOWLEDGMENT
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This work was supported by the National Key R&D Program of China (No. 2017YFA0204800)
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and the National Natural Science Foundation of China (Nos 51420105003, 11327901, 11525415,
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11674052). Q. Z. acknowledges funding support from the China Scholarship Council
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(201606090071) and Scientific Research Foundation of Graduate School of Southeast University
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(YBPY1708). The work by Q.Z. and H.Z. at LBNL was supported by the U.S. Department of
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Energy, Office of Science, Office of Basic Energy Sciences, Materials Sciences and Engineering
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Division under Contract No. DE-AC02-05-CH11231 within the KC22ZH program.
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ABBREVIATIONS
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Cu2S, copper sulphide; HRTEM, high resolution transmission electron microscope; STM-TEM,
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scanning tunneling microscopic-transmission electron microscope system; HC, high chalcocite;
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LC, low chalcocite; NW, nanowire; SAED, selected area electron diffraction; EELS, energy-loss
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spectroscopy; FFT, fast Fourier transformation; NEB, Nudged Elastic Band.
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REFERENCES
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1. Wang, L.-W. Phys. Rev. Lett. 2012, 108, (8), 085703. 2. Morcrette, M.; Rozier, P.; Dupont, L.; Mugnier, E.; Sannier, L.; Galy, J.; Tarascon, J. M. Nat. Mater. 2003, 2, (11), 755-61. 3. Liu, H.; Shi, X.; Xu, F.; Zhang, L.; Zhang, W.; Chen, L.; Li, Q.; Uher, C.; Day, T.; Snyder, G. J. Nat. Mater. 2012, 11, (5), 422-5. 4. He, Y.; Day, T.; Zhang, T.; Liu, H.; Shi, X.; Chen, L.; Snyder, G. J. Adv. Mater. 2014, 26, (23), 3974-8. 5. Chen, C. C.; Fu, L.; Maier, J. Nature 2016, 536, (7615), 159-64. 6. Ohno, T.; Hasegawa, T.; Tsuruoka, T.; Terabe, K.; Gimzewski, J. K.; Aono, M. Nat. Mater. 2011, 10, (8), 591-5. 7. Aoki, Y.; Wiemann, C.; Feyer, V.; Kim, H. S.; Schneider, C. M.; Ill-Yoo, H.; Martin, M. Nat. Commun. 2014, 5, 3473. 8. Wang, J.; Chen, K.; Gong, M.; Xu, B.; Yang, Q. Nano Lett. 2013, 13, (9), 3996-4000. 9. Terabe, K.; Hasegawa, T.; Nakayama, T.; Aono, M. Nature 2005, 433, (7021), 47-50. 10. Maier, J. Nat. Mater. 2005, 4, (11), 805-815. Sata, N.; Eberman, K.; Eberl, K.; Maier, J. Nature 2000, 408, (6815), 946-949. 11. 12. Valov, I.; Sapezanskaia, I.; Nayak, A.; Tsuruoka, T.; Bredow, T.; Hasegawa, T.; Staikov, G.; Aono, M.; Waser, R. Nat. Mater. 2012, 11, (6), 530-5. 13. Wedig, A.; Luebben, M.; Cho, D. Y.; Moors, M.; Skaja, K.; Rana, V.; Hasegawa, T.; Adepalli, K. K.; Yildiz, B.; Waser, R.; Valov, I. Nat. Nanotechnol. 2016, 11, (1), 67-74. 14. Nayak, A.; Tamura, T.; Tsuruoka, T.; Terabe, K.; Hosaka, S.; Hasegawa, T.; Aono, M. J. Phys. Chem. Lett. 2010, 1, (3), 604-608. 15. Xu, Z.; Bando, Y.; Wang, W.; Bai, X.; Golberg, D. ACS nano 2010, 4, (5), 2515-2522. McDowell, M. T.; Lu, Z.; Koski, K. J.; Yu, J. H.; Zheng, G.; Cui, Y. Nano letters 2015, 15, (2), 1264-1271. 16. 17. Nayak, A.; Tsuruoka, T.; Terabe, K.; Hasegawa, T.; Aono, M. Nanotechnology 2011, 22, (23), 235201. 18. Zheng, H.; Rivest, J. B.; Miller, T. A.; Sadtler, B.; Lindenberg, A.; Toney, M. F.; Wang, L. W.; Kisielowski, C.; Alivisatos, A. P. Science 2011, 333, (6039), 206-209. 19. Rivest, J. B.; Fong, L.-K.; Jain, P. K.; Toney, M. F.; Alivisatos, A. P. The Journal of Physical Chemistry Letters 2011, 2, (19), 2402-2406. 20. Okamoto, K.; Kawai, S. Jpn. J. Appl. Phys. 1973, 12, (8), 1130. Zhang, Q.; Yin, K.; Dong, H.; Zhou, Y.; Tan, X.; Yu, K.; Hu, X.; Xu, T.; Zhu, C.; Xia, W. Nat. Commun. 21. 2017, 8, 14889. 22. Yokota, I. J. Phys. Soc. Jpn. 1966, 21, (3), 420-423. 23. He, X.; Zhu, Y.; Mo, Y. Nat. Commun. 2017, 8, 15893. 24. Zhang, C.; Cretu, O.; Kvashnin, D. G.; Kawamoto, N.; Mitome, M.; Wang, X.; Bando, Y.; Sorokin, P. B.; Golberg, D. Nano letters 2016, 16, (10), 6008-6013. 25. Yan, Z.; Liu, J.-M. Sci. Rep. 2013, 3, 02482.
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Figure 1. Pseudo-electroelasticity deformation of Cu2S NWs. (a) Schematic illustration of the in situ experimental setup. In the experimental setup, the Cu2S NW was supported on a half-Au grid and the other end contacted to a grounded W tip, both working as chemical inert electrodes. (b) Current vs. time and length vs. time curves are recorded during the pseudo-electroelasticity process. The applied voltage for ion extrusion is 0.5 V lasting 60 s and 0 V for the insertion process. Error bars indicate the standard deviation. (c-l) Snapshots of the pseudo-electroelasticity process demonstrating Cu protrusion growth and dissolution. The Cu2S NW has an initial length of 420 nm (almost recovered with a final length of 400 nm) and diameter of 38 nm (unchanged). Scale bars, 200 nm. (m) Schematics of the extrusion and re-insertion process. The NW is divided into two parts: one part (P1) loaded on the gold grid acts as a Cu+ ion reservoir and the other part projecting out of the grid (P2) is mainly used for the transmission of Cu+ ions. During extrusion process, the Cu+ ions in P2 are driven out of their regular positions, while the Cu+ ions in P1 migrate into P2 to fill the Cu+ ion vacancies. The extruded Cu+ ions are blocked/oxidized at the Cu2S/W interface and are pushed forward by the new oxidized Cu atoms. During re-insertion process, the Cu+ ions in P2 migrate back into P1 and following the extruded Cu+ ions move back into P2. The blue and red arrows refer to the extrusion and re-insertion process, respectively. 159x142mm (300 x 300 DPI)
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Figure 2. Microstructure evolution of the NW during the pseudo electroelasticity process. (a-d) Top: TEM images of one Cu2S NW during the extrusion process at different times; bottom: HRTEM images of the corresponding red dot square areas (left) and corresponding FFT patterns (right). (e) Line profiles of FFT patterns along the [100] direction of S sublattice ([1 ̅02] direction of the LC or [100] direction of HC) showing phase evolution. (f) Atomic structure of HC phase Cu2S. Four different Cu sites are marked in green, with the fraction of color showing the fractional occupancy of the respective site. Highlighted are the Cu atoms in the 2b site (the most probable site) participating in the c channel migration. (g) The energy landscape of concerted migration of Cu 2b atoms along the c channel (shown in inset). (h-k) Top: TEM images of one Cu2S NW during the insertion process; bottom: HRTEM images of the corresponding blue dot square areas (left) and corresponding FFT patterns (right), with the Cu2S, Cu protrusion, and W tip highlighted in golden, green and blue, respectively. The weak contrast of blue part in (a-d) is amorphous carbon coating on W tip which does not influence the experiment. 162x148mm (300 x 300 DPI)
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Figure 3. Dynamics of the pseudo-electroelasticity process. (a) Schematic description of the forces acting on the Cu+ ions. The electrochemical driving force (FEC) is a combination of both chemical driving force (FC) and the electrical driving force (FE), FEC=FE+FC. (b) The relaxation time of Cu extrusion and the projected areas of protrusions at 30 s vary with the applied voltages. (c) Schematic diagrams showing the force analysis of four different boundary states in the whole process. (d) The corresponding electron electrochemical potential distribution in the four different states. Electrochemical potential (µ ̃) equals the sum of electrical potential (φ) and chemical potential (µ). The vertical arrows indicate the shift of the equilibrium and the horizontal arrows indicate the direction of the external electric field (ξ). 204x239mm (300 x 300 DPI)
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Figure 4. Single nanowire electric nanoactuator. (a) Sequential images showing the whole process of a Cu2S nanoactuator. During 1V biasing, the W tip is pushed away by the protrusion formed by extruded Cu. After biasing, the Cu2S NW constricts spontaneously and the W tip returns to its original position (Video 3). So the Cu2S NW can be used as a nanoactuator to drive reciprocating motion of an object. The golden color highlights the Cu2S; the green color highlights Cu protrusion and the blue color highlights W tip. (b) The change in the relative distance marked by red two-way arrow (from W tip to Cu/Cu2S interface) and angle θ marked by two blue arrows in (a) during the pseudo-electroelasticity process. (c) Repeatability of a nanoactuator behavior. 138x107mm (300 x 300 DPI)
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