Surface-Localized Sealing of Porous Ultralow-k Dielectric Films with

University, Seoul 03722, Republic of Korea. ∥ Lam Research Corporation, Fremont, California 94538, United States. ACS Nano , Article ASAP. DOI: ...
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Surface-Localized Sealing of Porous Ultralow‑k Dielectric Films with Ultrathin (40%, dielectric constant (k)