446
J. Phys. Chem. 19!33,97, 446453
Structural, Chemical, and Electronic Properties of Cu/Ta( 110) W.Kevin Kuhn,+ Robert A. Campbell,* and D. Wayne Coodman’ Department of Chemistry, Texas A 6 M University, College Station, Texas 77843 Received: June 8, 1992; In Final Form: September 8, 1992
The properties of ultrathin Cu films on a Ta(ll0) substrate have been studied using X-ray photoelectron spectroscopy (XPS), low-energy electron diffraction (LEED), temperature-programmed desorption (TPD), and infrared reflection adsorption spectroscopy (IRAS). For coverages of
