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The Colloid Chemistry of Silica
In The Colloid Chemistry of Silica; Bergna, H.; Advances in Chemistry; American Chemical Society: Washington, DC, 1994.
In The Colloid Chemistry of Silica; Bergna, H.; Advances in Chemistry; American Chemical Society: Washington, DC, 1994.
Downloaded by UNIV QUEENSLAND on September 16, 2013 | http://pubs.acs.org Publication Date: May 5, 1994 | doi: 10.1021/ba-1994-0234.fw001
ADVANCES
IN
CHEMISTRY
SERIES
The Colloid Chemistry of Silica Downloaded by UNIV QUEENSLAND on September 16, 2013 | http://pubs.acs.org Publication Date: May 5, 1994 | doi: 10.1021/ba-1994-0234.fw001
Horacio E. Bergna, EDITOR DuPont
Developed from a symposium sponsored by the Division of Colloid and Surface Chemistry, at the 200th National Meeting of the American Chemical Society, Washington, DC, August 26-31, 1990
American Chemical Society, Washington, DC 1994
In The Colloid Chemistry of Silica; Bergna, H.; Advances in Chemistry; American Chemical Society: Washington, DC, 1994.
234
Library of Congress
Cataloging-in-Publication
Data
The Colloid chemistry of silica: developed from a symposium sponsored by the Division of Colloid and Surface Chemistry at the 200th National Meeting of the American Chemical Society, Washington, D C , August 26-31, 1990 / Horacio E . Bergna, editor. p.
cm.—(Advances i n chemistry series, ISSN 0065-2393; 234)
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Papers from the Ralph K. Iler Memorial Symposium. Includes bibliographical references and indexes. I S B N 0-8412-2103-0 1. Colloids—Congresses. 2. Silica—Congresses. I. Bergna, Horacio E . , 1924- . II. American Chemical Society. Division of Colloid and Surface Chemistry. III. American Chemical Society. Meeting (200th: 1990: Washington, D.C.) IV. Ralph K. Iler Memorial Symposium (1990: Washington, D.C.) V. Series. QD1.A355 no. 234 [QD549] 540 s—dc20 [546'.683]
93-11456 CIP
The paper used i n this publication meets the minimum requirements of American National Standard for Information Sciences—Permanence of Paper for Printed Library Materials, A N S I Z39.481984. Copyright © 1994 American Chemical Society A l l Rights Reserved. The appearance of the code at the bottom of the first page of each chapter i n this volume indicates the copyright owner's consent that reprographic copies of the chapter may be made for personal or internal use or for the personal or internal use of specific clients. This consent is given on the condition, however, that the copier pay the stated per-copy fee through the Copyright Clearance Center, Inc., 27 Congress Street, Salem, MA 01970, for copying beyond that permitted by Sections 107 or 108 of the U.S. Copyright Law. This consent does not extend to copying or transmission by any means—graphic or electronic—for any other purpose, such as for general distribution, for advertising or promotional purposes, for creating a new collective work, for resale, or for information storage and retrieval systems. The copying fee for each chapter is indicated i n the code at the bottom of the first page of the chapter. The citation of trade names and/or names of manufacturers in this publication is not to be construed as an endorsement or as approval by A C S of the commercial products or services referenced herein; nor should the mere reference herein to any drawing, specification, chemical process, or other data be regarded as a license or as a conveyance of any right or permission to the holder, reader, or any other person or corporation, to manufacture, reproduce, use, or sell any patented invention or copyrighted work that may i n any way be related thereto. Registered names, trademarks, etc., used i n this publication, even without specific indication thereof, are not to be considered unprotected by law. PRINTED
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In The Colloid Chemistry of Silica; Bergna, H.; Advances in Chemistry; American Chemical Society: Washington, DC, 1994.
1994 Advisory Board Advances in Chemistry Series
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M. Joan Comstock, Series
Editor
Robert J . A l a i m o Procter & Gamble Pharmaceuticals
Douglas R. L loyd The University of Texas at Austin
Mark Arnold University of Iowa
C y n t h i a A . Maryanoff R. W. Johnson Pharmaceutical Research Institute
David Baker University of Tennessee A r i n d a m Bose Pfizer Central Research Robert F. Brady, Jr. Naval Research Laboratory
Julius J . M e n n Plant Sciences Institute, U.S. Department of Agriculture Roger A . M i n e a r University of Illinois at Urbana-Champaign
Margaret A . Cavanaugh National Science Foundation
V i n c e n t Pecoraro University of Michigan
Arthur B. Ellis University of Wisconsin at Madison
M a r s h a l l Phillips Delmont Laboratories
D e n n i s W. Hess Lehigh University
G e o r g e W. Roberts North Carolina State University
H i r o s h i Ito IBM Almaden Research Center
A . T r u m a n Schwartz Macalaster College
M a d e l e i n e M . Joullie University of Pennsylvania
J o h n R. Shapley University of Illinois at Urbana-Champaign
L a w r e n c e P. K l e m a n n Nabisco Foods Group G r e t c h e n S. K o h l Dow-Corning Corporation Bonnie Lawlor Institute for Scientific Information
L . Somasundaram DuPont M i c h a e l D . Taylor Parke-Davis Pharmaceutical Research Peter W i l l e t t University of Sheffield (England)
In The Colloid Chemistry of Silica; Bergna, H.; Advances in Chemistry; American Chemical Society: Washington, DC, 1994.
FOREWORD
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The A D V A N C E S I N C H E M I S T R Y S E R I E S was founded in 1949 by the American
Chemical Society as an outlet for symposia and collections of data i n special areas of topical interest that could not be accommodated in the Society s journals. It provides a medium for symposia that would otherwise be fragmented because their papers would be distributed among several journals or not published at all. Papers are reviewed critically according to A C S editorial standards and receive the careful attention and processing characteristic of ACS publications. Volumes in the A D V A N C E S I N C H E M I S T R Y S E R I E S maintain the integrity of the symposia on which they are based; however, verbatim reproductions of previously published papers are not accepted. Papers may include reports of research as well as reviews, because symposia may embrace both types of presentation.
In The Colloid Chemistry of Silica; Bergna, H.; Advances in Chemistry; American Chemical Society: Washington, DC, 1994.
Downloaded by UNIV QUEENSLAND on September 16, 2013 | http://pubs.acs.org Publication Date: May 5, 1994 | doi: 10.1021/ba-1994-0234.fw001
ABOUT T H E EDITOR H O R A C I O E. B E R G N A is a Senior Research Associate at the DuPont Experimental Station. H e first joined DuPont in 1956 as part of Ralph K. Her s research group. Bergna received his Licenciado and doctorate in chemistry at the National University of L a Plata in Argentina and worked on his doctoral thesis (Honors) on clay electrokinetics under Marcos Tschapek at the National Institute of Soils i n Buenos Aires, Argentina. Bergna taught at the School of Chemistry in L a Plata and worked at L.E.M.I.T. (Technological Research Laboratory of the Province of Buenos Aires). H e did post-doctoral work at the Sorbonne in Paris and the Massachusetts Institute of Technology, where he worked with E . A. Hauser as a Guest of the Department of Chemical Engineering and as a Research Staff Member of the Division of Industrial Cooperation with J. Th. Overbeek, A. Gaudin, and P. de Bruyn. H e studied humanities at the City of London College and Columbia University. Bergna is the author of 30 papers and holds 31 U.S. patents and more than 200 foreign corresponding patents in subjects such as colloidal silica synthesis; silica; alumina; aluminosilicates; zeolites; vanadyl phosphate catalysts; submicron grained products for metallurgy; coated particulates for ceramics, electronics, chromatography, and polymers; and binders for foundry sands. In 1989 he was appointed Chevalier of the Ordre Des Palmes Académiques by the French government. Bergna is a retired president of the Alliance Française de Wilmington, Delaware, and a founder and chairman of the board of the Fondation Internationale de Delaware. In 1990 he organized and chaired the Ralph K. Her International Symposium on the Colloid Chemistry of Silica held at the 200th A C S National Meeting. Bergna co-authored the Colloidal Silica Section of the 1993 edition of the Ullmann Encyclopedia of Chemistry and guest edited two special issues of the Elsevier international journal Colloids and Surfaces.
vii
In The Colloid Chemistry of Silica; Bergna, H.; Advances in Chemistry; American Chemical Society: Washington, DC, 1994.
ASSOCIATE EDITORS
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M i c h a e l R. Baloga DuPont Jonathan L . Bass The P Q Corporation F. D u m o n t
Université Libre de Bruxelles James S. Falcone West Chester University Michael L . Hair Xerox Research Centre of Canada Bruce A. Keiser Nalco Chemical Company Robert E. Patterson The P Q Corporation George W. Scherer DuPont William A . Welsh W. R. Grace & Company
viii In The Colloid Chemistry of Silica; Bergna, H.; Advances in Chemistry; American Chemical Society: Washington, DC, 1994.
