Enhancing Efficiency and Stability of Perovskite Solar Cells via a Self

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Enhancing Efficiency and Stability of Perovskite Solar Cells via a Self-Assembled Dopamine Interfacial Layer Meihui Hou, Haijuan Zhang, Ze Wang, Yingdong Xia, YongHua Chen, and Wei Huang ACS Appl. Mater. Interfaces, Just Accepted Manuscript • DOI: 10.1021/acsami.8b10332 • Publication Date (Web): 17 Aug 2018 Downloaded from http://pubs.acs.org on August 18, 2018

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ACS Applied Materials & Interfaces

Enhancing Efficiency and Stability of Perovskite Solar Cells via a Self-Assembled Dopamine Interfacial Layer

Meihui Hou,† Haijuan Zhang†, Ze Wang,† Yingdong Xia,†* Yonghua Chen,†* Wei Huang†,‡,§

†Key

Laboratory of Flexible Electronics (KLOFE) & Institution of Advanced Materials (IAM), Jiangsu National Synergetic Innovation Center for Advanced Materials (SICAM), Nanjing Tech University (NanjingTech), Nanjing 211816, Jiangsu, China ‡Shaanxi Institute of Flexible Electronics (SIFE), Northwestern Polytechnical University (NPU), Xi'an 710072, Shaanxi, China §Key Laboratory for Organic Electronics & Information Displays (KLOEID), and Institute of Advanced Materials (IAM), Nanjing University of Posts and Telecommunications, Nanjing 210023, Jiangsu, China Email: [email protected]; [email protected]

KEYWORDS: high efficiency, stability, interface engineering, dopamine, perovskite solar cells

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ABSTRACT Interfacial engineering is a simple and effective strategy that can improve the photovoltaic performance in organic-inorganic perovskite solar cells (PSCs). Herein, a dopamine (DA) self-assembled monolayer (SAM) was introduced on the top of the SnO2 electron transporting layer (ETL) to modify the SnO2/perovskite interface. The processing temperature of the present devices is around 150°C, and the power conversion efficiency (PCE) of the PSCs was significantly improved to 16.65% compared to that of the device without modification (14.05%). Such enhancement in efficiency is mainly attributed to the improved quality of perovskite films by improving the affinity of the SnO2 ETL, thus leading to better carrier transport and low charge recombination at the SnO2/perovskite interface. Moreover, the modified device by DA SAM exhibited enhanced stability compared to the device without modification. Our results suggest that the introduction of DA SAM on the ETL/perovskite interface is a promising method for highly efficient and stable PSCs.

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INTRODUCTION Organic-inorganic perovskite solar cells (PSCs) have made extraordinary developments since they were first proposed by Miyasaka and co-workers in 2009.1-3The perovskite materials exhibit outstanding optoelectronic properties, such as long exciton diffusion length,4 high charge mobility,5 tunable optical band gap,6 and high light absorption coefficient.7 In the past few years, the PSCs have substantially surpassed organic solar cells (OPV) and dye-sensitized solar cells (DSSC) with certified power conversion efficiency (PCE) of 22.7%,8,9 which can compete with traditional commercialized polycrystalline-silicon solar cells and inorganic thin-film solar cells, such as amorphous silicon, CZTS, and CdTe thin film solar cells.1,8 Together with the advantages of simple preparation and low cost over the complex processes and high cost in the traditional solar cells, PSCs have great potential in future commercial applications. In order to improve the performance of PSCs, many efforts has been explored, such as the fabrication approach of perovskite films,2,10 the design of novel device structure,11 the composition engineering of the perovskite structure,12,13 and the interfacial modification.14-16 Among them, interfacial modification, especially the interface of ETL/perovskite interface, has been widely used as an effective method to improve the device performance by facilitating charge extraction, reducing charge recombination, avoiding the leakage current, and controlling the perovskite crystals growth.17-19 Recently,SnO2 has been demonstrated as an effective ETL in PSCs due to its good electrical and optical properties i.e., a suitable 3

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energy level, high carrier mobility, and good anti-reflection ability20 to improve the device electronic collection capabilities and avoid the non-stoichiometric defects of TiO2 and thermal instability of ZnO.21,22 Moreover, SnO2 thin films can be prepared in low temperature (< 200oC), which is helpful for widespread implementation of PSCs.23 Recently, the interface engineering between SnO2 and perovskite have been intensively explored with respect to the electron extraction such as energy level alignment and interfacial contact.24 On one hand, improved carrier transport and optimized the energy level matching between SnO2 and perovskite interface were achieved via doping low concentration metals ions, such as Li+,25 Y3+,26 Mg2+27 in SnO2 , leading to the enhanced device performance. On the other hand, interface modification by ultra-thin fullerenes to effectively passivate both perovskite grain boundaries and the SnO2/perovskite interface28 and by TiCl4 treatment of SnO2 to enhance crystallization and the surface coverage of perovskites, reducing the charge carriers recombination and facilitating the charge extraction.29 In fact, a self-assembled layer (SAM) is also an effective interfacial layer which has favorable effects on interface modification, such as modulate the surface energy and enhance the affinities of the films or substrates by imparting a dipole moment at the interface30 and passivating inorganic surface states by chemical bonding, thus tuning the surface electronic states and the interfacial optoelectronic properties. It has been proved that a layer of fullerene derivatives,31 3-aminopropionic acid28, and organic silane,30 can be an effective SAM layer on the TiO2 or ZnO2 film to effectively improve the device performance. 4

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In addition, organics C6020 and 3-aminopropyltriethoxysilane (APTES)32 can be used as a SAM to modify the SnO2 ETL, and the efficiency of the devices modified with SAM has exceeded 18%33 indicating that SAM is a very promising strategy for interface modification. In this work, we introduced a dopamine (DA) SAM with two functional hydroxyl and amino groups as the interfacial modification layer between SnO2 and perovskite. We found that 1) the terminal amino group can be used as the growth site of the perovskite crystal to regulate this growth and passivate the trap states on perovskite surface by hydrogen-bonding interactions (N–H/I), 2) the hydroxyl can react with SnO2 to further fix perovskite structure, 3) the frame of π-conjugated benzene structure is beneficial to the electron transport. Accordingly, the crystallinity and morphology of the perovskite films grown on the DA SAM modified SnO2 was significantly improved. Furthermore, the improved electron extraction from perovskite to SnO2 and the reduced charge recombination were observed, as a result of the increased short-circuit current density (Jsc) and the enhanced fill factor (FF). Consequently, the PSCs employing a DA SAM interfacial layer exhibited a better stability with high efficiency of 16.87%, which is much higher than the device without interfacial modification layer (14.05%).

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RESULTS AND DISCUSSION

Figure 1. (a) The preparation process of DA modification layer (b) schematic diagram of the DA SAM between SnO2 ETL and perovskite and (c) the typical planar PSC structure.

We prepared the DA interfacial modification layer as depicted in Figure 1a, where a DA SAM is to deposit on surface of SnO2-coated substrate. The DA is an ortho-dihydroxyaryl compound composed of functional goups including amino and hydroxyl. As shown in Figure 1b, the oxygen-hydroxyl atoms (-O-) of DA are prone to chemically bond with metal ions on SnO2 surface.34 Meanwhile, the terminal groups amino (-NH3+) of DA tend to act as growth sites for CH3NH3PbI3 to anchor the perovskite layer.35 Furthermore, the DA has the π-conjugated benzene structure and benefits easy electron transport.36 The structure of a typical planar PSC based on SnO2 ETL is shown in Figure 1c. The device employs SnO2 and Spiro-OMeTAD as electron and hole transport materials, respectively. To identify the formation of the DA SAM on SnO2 surface, X-ray photoelectron spectroscopy (XPS) measurement was performed (Figure S1, Supporting information). N contents were increased after the DA SAM modification. In contrast to SnO2, after DA modification, the SnO2 substrate shows a binding 6

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energy at 400 eV which attributed to N 1s of the -NH3+ terminal group on the DA molecule respectively. These results indicated that the DA SAM was successfully introduced onto the SnO2 surface.

Figure 2. SEM images of perovskite films deposited on SnO2-coated substrates with different DA SAM treatment times: (a) 0 h; (b) 1 h; (c) 6 h; (d) 12 h and AFM images of SnO2 ETLs deposited on ITO (e) with (treatment time is 6 h) and (f) without DA modification.

The morphology and crystallinity of perovskite thin films have dramatic effects on device performance. Many methods have been explored to improve the morphology, and it has been proved that the control of nucleation and growth during the film formation can effectively regulate the film morphology.37,38 In addition, the affinity of the material may also affect the morphology of the perovskite film.35,38,39 In order to investigate the effects of the DA SAM interfacial layer on CH3NH3PbI3 morphologies, scanning electron microscopy (SEM) images (Figure 2a-d) were presented corresponding to perovskite layers deposited on the SnO2-coated substrates with different treatment time, i.e., 0, 1, 6, and 12 h. We observe a similarly dense perovskite surface morphology for the bare and DA SAM 7

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modified SnO2-coated substrates. However, the grain size of perovskite thin films grown on DA SAM modified SnO2 substrate is larger than that on the bare SnO2 substrate. Especially when the DA SAM treatment time is 6 h, the perovskite film showed a relatively large grain size (> 600 nm) with uniform and smoother surface (Figure 2c). It should be noted that solvent engineering used here is to get quick crystallization, the growth behavior of perovskite on pristine and modified SnO2 is similar without employing solvent engineering. The changed surface morphology with DA SAM modification is consistently observed using AFM (Figure 2e-f). After DA SAM modified, the SnO2 surface exhibits a more uniform feature with a root-mean-square (rms) surface roughness of 2.574 nm than that without modification (rms=5.911 nm). The improved perovskite morphology demonstrated that the DA interfacial layer could act as a template to facilitate the perovskite crystal growth, thus improving the perovskite morphology and increasing the grain size. This phenomenon could be attributed to the formation of a hydrogen bond between the -NH3+ groups of DA and the halide anions of the perovskite, as demonstrated in previous reports,40 thereby increasing the surface affinity between the perovskite layer and the SnO2 ETL. Besides, the surface energy of SnO2 can be adjusted by the insert of DA, thence we also examined the surface wettability of water on bare or DA SAM modified SnO2, as shown in Figure S2. In fact, normally the SnO2 ETL was treated with UV-ozone (UVO). The pristine SnO2 has a large contact angle of 58.8o while the contact angle was reduced to 6.5o and 22.3o after UVO and DA treatment, respectively, corresponding to the 8

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morphological improvement of perovskites, especially the smoother and larger crystal size on DA modified SnO2. In addition, the interfacial contact is critical for the charge extraction, we also investigated the work function (WF) of SnO2 with different modification time. As shown in Figure S3, the WF of SnO2 ETL decreased from 4.76 eV to 4.56 eV, indicating that the DA modification can efficiently decrease the work function of the SnO2, which may be due to the formation of dipoles at the interface between SnO2 ETL and perovskite. The modified work function is further close to the LUMO of MAPbI3 perovskites (3.9 eV), thereby improved the energy level alignment and the charge extraction efficiency.

Figure 3. (a) XRD patterns and (b) ultraviolet-visible (UV-vis) absorption spectra of thin-film MAPbI3 perovskites deposited on SnO2-coated substrate with different DA SAM modification time, (c) photoluminescence (PL) and (d) time-resolved PL (TRPL) spectra of perovskite films deposited on SnO2 films with and without DA SAM modification.

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We further investigated the influence of the incorporated DA SAM interfacial layer on crystallinity of perovskite films by using X-ray diffraction (XRD). The XRD patterns, shown in Figure 3a, display the crystallization of CH3NH3PbI3 perovskite grown on bare and DA SAM modified SnO2-coated substrates with different modification time respectively. The crystal growth direction of the perovskite grown on different substrates showed almost the same. The diffraction peaks at 14.2o and 28.4 o are assigned to the (110) and (220) planes of tetragonal crystal structure of CH3NH3PbI3, according to the previous report.41 With the increase of the DA modification time, perovskite diffraction peaks became significantly enhanced, indicating the crystallinity of perovskite films is improved. The observation agrees with the enlarged grains shown by SEM in Figure 2. Stronger crystallinity also means fewer surface defects, which would be beneficial to the performance of PSCs. Figure 3b shows ultra-visible (UV-vis) absorption spectroscopy perovskite films deposited on bare and DA SAM modified SnO2-coated substrates with different modification time. The film with DA SAM modification displays a slightly increase in absorbance near the blue and green color regime, possibly related to the enhanced crystallinity of CH3NH3PbI3. In addition, we found that the absorption will decrease when the time reaches 12 h, which is due to the fact that too much DA will cause a decrease in transmittance of SnO2-coated substrate and thus influence the light absorption (Figure S4). The photoluminescence

(PL)

measurements,

including

steady-state

PL

and

time-resolved PL (TRPL), were employed to study the impact of DA modification 10

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on the extraction of electrons and charge recombination. As shown in Figure 3c, compared to the control perovskite film, the sample with the SnO2/DA/perovskite quenches PL much more than that with the SnO2/DA/perovskite and the PL quenching of the perovskite film formed on DA modified SnO2 substrate is much more efficient than that grown on the bared SnO2, suggesting enhanced electron extraction ability and the reduced recombination of holes and electrons.32,42 Furthermore,

when

compared

to

the

pristine

perovskite

film

and

SnO2/perovskite layer, the PL spectra displays a blue shifting of 6 nm for SnO2/DA/perovskite, indicating that the surface trap state passivation close to the bottom surface in the perovskite film after DA SAM modification.43 The reduced surface trap states of the perovskite film may be attributed to the passivation effect by hydrogen-bonding interactions between the -NH3+ groups of DA and the halide anions of the perovskite. In addition, the TRPL decay measurements and the stretched exponential decay lifetimes were obtained by fitting the data with a biexponential decay function,44 as shown in Figure 3d. The SnO2/DA/perovskite shows shorter lifetime (8.184 ns) than that of SnO2/perovskite (19.061 ns), which indicates a lower defect concentration and hence faster electron transfer from perovskite to SnO2 after the DA SAM modification and reduction of the electrons and holes recombination at the SnO2/perovskite interface.

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Figure 4 (a) Best PCE of the devices with different DA treatment times and (b) the histogram of efficiencies among 20 devices. (c) J–V curves measured under reverse and forward voltage scanning and (d) External quantum efficiency (EQE) of the devices deposited on SnO2 ETL with or without a DA SAM modification.

Table 1 Photovoltaic parameters of planar PSCs with different DA modification time. Time (h)

Voc (V)

Jsc (mA cm-2)

FF

PCE (%)

0

1.04±0.01

19.97±0.2

0.675±0.02

14.05±0.4

1

1.05±0.02

20.93±0.4

0.710±0.04

15.25±0.5

6

1.05±0.02

21.80±0.3

0.739±0.06

16.87±0.5

12

1.05±0.01

20.51±0.3

0.653±0.02

14.16±0.4

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Table 2 Photovoltaic parameters of 6h DA modified SnO2-based planar perovskite solar cells investigated by different scanning directions. Device

Scanning

Voc (V)

Jsc (mA cm-2)

FF

PCE (%)

Reverse

1.04

19.96

0.676

14.05

Forward

1.04

19.07

0.636

12.63

Reverse

1.05

21.80

0.739

16.87

Forward

1.05

21.72

0.718

16.31

direction

SnO2

SnO2/DA

Figure 4a shows the photocurrent density-voltage (J-V) characteristics of planar PSCs with bare SnO2 (0 h) or DA SAM modified SnO2 (1 h, 6 h, 12 h) ETL under AM 1.5G illumination with light intensity of 100 mW cm-2. The key cell parameters are summarized in Table 1. The PSC with bare SnO2 ETL acts as a control device, giving a short-circuit photocurrent density (Jsc) of 19.97 mA cm-2, an open-circuit voltage (Voc) of 1.04 V, a fill factor (FF) of 0.675, and yielding a power conversion efficiency (PCE) of 14.05%. In contrast, the PSCs with SnO2/DA ETL exhibit improvements in all Jsc , Voc and FF. Especially when the DA SAM modification time is 6 h, the device exhibits the best performance with a PCE of 16.87%, Jsc of 21.80 mA cm-2, Voc of 1.05 V, and FF of 0.739. The device performance is one of the best reports compared to previous reports (Table S1). Obviously, the Jsc and FF are higher than the reported data for 21.23 mA cm-2 and 69.2 respectively,32 and those of the prior works based on metal oxide charge transporters processed in the same temperature range.45 As discussed in SEM measurements, DA SAM interfacial layer plays a critical role in improving the 13

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quality of the active layer with large grains and fewer grain boundaries, which result in obvious enhancement in Jsc and FF. We ascribed the improvement in Jsc with DA SAM modification to improved photoelectron transport and extraction, which is consistent with the above-discussed PL and TRPL measurements. Moreover, the reproducibility of the device performance was evaluated by characterizing 20 individual PSCs based on bare SnO2 ETL or SnO2/DA ETL with 6 h modification for its outstanding performance, as shown in Figure 4b. Good reproducibility was shown for the DA SAM modified devices with a typical value over 15.5% compared to 12.5% in the devices without DA SAM modification. Our results indicate that high-performance PSCs can be repeatedly fabricated by DA modification of SnO2. The average device performance parameters are summarized in Figure S5. The devices showed a better performance after SnO2 was modified by DA SAM for Voc, Jsc, FF and PCE, indicating this is a simple and effective method to improve device performance. When the modification time of DA SAM is increased to 12 h, the PCE of the device is decreased to 14.16% (Table 1), which may result from the increase of the surface resistance due to the insulation nature of DA and severe charge recombination caused by reduced charge transport. Therefore,the following characterization was carried out based on the PSCs with an optimum DA SAM modification time of 6 h. The hysteresis of the devices was studied, as shown in Figure 4c. The commonly observed hysteresis is virtually negligible in the DA SAM modified devices and the corresponding parameters were summarized in Table 2 demonstrating the 14

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reliability of our DA SAM modified devices. Furthermore, the external quantum efficiency (EQE) measurements results was shown in Figure 4d, also confirm the enhanced improvement, where DA SAM modified device exhibited a broad EQE spectrum from 300 nm to 900 nm over 80%, which is obvious higher than device without modification. The integrated Jsc from EQE is another important parameter to prove that the Jsc of the device is enhanced by DA SAM interlayer. Figure 5a shows the PSCs with SnO2/DA ETL achieved a steady-state current density of 19.14 mA cm−2 and a steady-state PCE of 16.46% at a constant bias voltage of 0.86 V, suggesting that the DA SAM modification improved the electron extraction efficiency, contributing to most of the enhancement of current density and the device efficiency. Compared to the non-modified device, the performance enhancement of modified devices obviously results from the increased Jsc value (from 19.97 to 21.80 mA cm-2) and the higher FF (see table 1). Moreover, the device stability can be enhanced when modified by DA (Figure 5b), the efficiency of the DA-modified device remains above 80% while the pristine device efficiency has dropped below 50% after exposing in air for 12 days. The enhanced current density is associated with the enhanced carrier transport of the perovskite films caused by improved perovskite film quality after modification by DA SAM, as shown in Figure S6, which displays the enhanced current density in the electron-only devices. This result further confirmed that the energy barrier at the SnO2/perovskite interface was reduced and enhanced electron transport ability. The trap-state density measurements were also conducted, as shown in Figure 5c, 15

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d. The value was calculated by the trap-filled limit voltage using equation46: ܰ‫= ݐ‬

2ߝ0 ߝ‫ܮܨܸܶ ݎ‬ ‫ܮݍ‬2

where VTFL is the onset voltage of the trap-filled limit region, ε0 and εr are the vacuum permittivity and the relative dielectric constant respectively, q is the elemental charge, and L is considered to be the thickness of the perovskite film (Here we take 250 nm, the effect of the thickness of the perovskite film before and after the modification is almost negligible). We found that the trap-state density was reduced from 7.08*1015 cm3 to 4.72*1015 cm3 after DA SAM modification. To further clarify the significant changes caused by the DA SAM modification, electrochemical impedance spectroscopy (EIS) was carried out on the devices with bare or DA modified SnO2 ETL under 0.5 V DC bias (Figure 5e). The SnO2 based PSC shows a higher device contact resistance (950 Ω) than the SnO2/DA based PSC (1083 Ω), suggesting better charge transport in the SnO2/DA based device.47 The only difference between the two devices is the modification of SnO2, thus it is rational to attribute the reduced device contact resistance to the introduction of DA SAM.48 These results are consistent with the enhancement in Jsc for SnO2/DA based PSCs (shown in Table 2). We also found that the reduced recombination was achieved in the modified devices. As seen in Figure 5f, the dark current density of the modified device is obviously lower than the device without modification, which indicates that the introduction of DA at the SnO2/perovskite interface can prevent the current leakage to a certain extent. Since the current leakage is mainly related to the recombination of carriers, 16

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thereby contributing to the improvement of the device efficiency. The Jsc/Voc vs. light intensity characterization of the device on SnO2 with or without DA modification was shown in Figure S7. We found a good linear relationship between Jsc and light intensity. The slope of the device based on the DA modified SnO2 is 0.97 when the pristine SnO2 device is 0.96, which is close to 1, indicating that the bimolecular recombination in the devices is almost negligible. Figure S7(b) shows the Voc vs. light intensity, the slope represents the trap-assisted recombination. It can be seen that the slope of the device based on the original SnO2 reaches 1.65, and the DA modified device is only about 1.18, indicating that the DA Modification can significantly reduce trap-assisted recombination in the device, which is also agreement with the conclusion in Figure 5(c) and (d) that the DA modification can help to reduce the trap-state density of the perovskite film grown SnO2, thereby contributing to good device performance.49,50

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Figure 5. (a) Steady-state efficiencies of the PSCs measured at constant bias voltages of 0.86 V and integrated photocurrent density JSC for the PSCs. (b) Stability of the devices with and without DA in air with humidity of ~70%. Current density-Voltage curves and trap density of perovskite films on (c) SnO2 and (d) SnO2/DA. (e) Nyquist plots for PSCs with or without DA, EIS was measured in dark condition. (f) J−V curves measured in the dark condition with reverse scan direction.

CONCLUSIONS We have demonstrated that the introduction of the DA SAM is a simple and efficient method to modify the SnO2/perovskite interface and improve device performance. After the DA modification, SnO2 gets more hydrophilic and could 18

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facilitate the formation of perovskite film with better morphologies and enhanced crystallinity. Additionally, the DA SAM interlayer results in the efficient electron extraction and reduces the charge recombination. Accordingly, the device efficiency was significantly improved from 14.05% to 16.87%, which was mainly attributed to the increase of Jsc and FF. This work provides a feasible approach to achieve high-performance PSCs by utilizing DA SAM as the interfacial layer. We believe that interfacial modification is a simple and effective method to improve the performance of perovskite solar cells.

EXPERIMENTAL SECTION Materials and Reagents. Lead iodide (PbI2, 99.99%) was purchased from TCI (Shanghai) Development Co., Ltd. Methylammonium iodide (CH3NH3I, 99.5%), 2,2',7,7'-tetrakis(N,N-di-p-methoxyphenylamine)-9,9'-spirobifluorene(spiro-OMe TAD, 99.5%), bis(trifluoromethane)sulfonamide lithium (Li-TFSI, 99%) and 4-tert-butylpyridine (TBP, 98%), were obtained from Shanghai MaterWin New Materials Co., Ltd. Tin(Ⅳ) oxide SnO2 solution (15% in H2O colloidal dispersion) was purchased from Alfa aesar (China) chemical Co., Ltd. The other solvents were purchased from Sigma-Aldrich Co. Ltd. Unless indicated, all the chemicals were directly used without further purification. Device Fabrication and Characterization: Indium tin oxide (ITO) substrate was cleaned sequentially with detergent, deionized water, acetone, and ethanol by using an ultrasonic bath for 20 min, respectively. Before use, the ITO substrates were treated by UV-O3 for 15 min. The SnO2 solution was spin-coated onto the cleaned ITO substrate at 4000 rpm for 40 s and annealed at 150°C for 30 min. Then the SnO2-coated substrates were immersed into the 2mM solution of 3-Hydroxytyramine hydrochloride in deionized water for several hours to induce a 19

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DA SAM on the surface of SnO2. Then the substrates were rinsed in ethanol and then dried under a flow of N2. The perovskite precursor solution contained 461 mg PbI2 and 159 mg CH3NH3I in a 1 ml mixed solvent of DMSO and DMF (VDMSO:VDMF=1:4, stirred at 60°C for 1 h), filtrated before used. CH3NH3PbI3 perovskite precursor solution was coated onto the SnO2 with or without modification substrate by spin-coated at 1000 rpm for 10 s and 4000 rpm for 30 s, 250 μL chlorobenzene (CB) washed the perovskite thin film when 10 s in the second spin-coating progress. The perovskite thin films were then annealed at 100°C for about 10 min on a hotplate. After the substrates were cooled down to room temperature, the hole transport layer of spiro-OMeTAD which prepared by dissoving 72.3 mg spiro-OMeTAD, 17.5 µl Li-TFSI (520 mg/ml in acetonitrile) and 28.8 µl TBP in 1ml chlorobenzene was spin-coated at 3000 rpm for 30 s. Finally, 80-nm- thick of Au was thermally evaporated in vacuum to form the electrode. Absorbance spectra were measured by using a shimadzu UV-1750 UV-Visible spectrophotometer (Japan). The steady-state photoluminescence (PL) and time-resolved photoluminescence (TRPL) spectra was obtained by Hitachi F-4600 spectrofluorometer (Japan) and FLS980 Edinburgh Instruments Ltd, respectively. The atomic force microscopy (AFM) images were taken by Park XE-7. The X-ray diffraction (XRD) data were collected by RIGAKU D/MAX-3A diffractommeter. The top-view scanning electron microscopy (SEM) of perovskite films was investigated by Hitachi S-4800. The contact angles of SnO2 with and without modification were measured on a system of DSA1005 (KRUSS GmbH). J-V curves were acquired with a Keithley 2400 source/meter from 1.2 V to -0.2V or -0.2 to 1.2 V at 0.02 V/step under AM 1.5 by using an Enlitech SS-F5-3A solar simulator with irradiation at 100 mW/cm2. The dark J-V data were measured with the same method from 1.5 V to -0.5 V in dark condition.

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ASSOCIATED CONTENT Supporting Information Details about sample characterisations and additional figures, including XPS peaks and the contact angle of the SnO2 films, photovoltaic parameters statistics of planar PSCs, J-V curves of electron-only devices and Voc vs. light intensity for planar PSCs.

AUTHOR INFORMATION Corresponding Author *E-mail: [email protected]; [email protected]

Notes The authors declare no competing financial interest.

ACKNOWLEDGMENTS This work was financially supported by the National Basic Research Program of China, Fundamental Studies of Perovskite Solar Cells (Grant 2015CB932200), the Natural Science Foundation of China (Grants 51602149, 61705102, and 91733302), Natural Science Foundation of Jiangsu Province, China (Grants BK20161011 and BK20161010), Young 1000 Talents Global Recruitment Program of China, Jiangsu Specially-Appointed Professor program, “Six talent peaks” Project in Jiangsu Province, China, and Startup from Nanjing Tech University.

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