4034
Langmuir 2000, 16, 4034-4039
In Situ Mass Spectrometry Study on Surface Reactions in Atomic Layer Deposition of Al2O3 Thin Films from Trimethylaluminum and Water Marika Juppo,* Antti Rahtu, Mikko Ritala, and Markku Leskela¨ Laboratory of Inorganic Chemistry, Department of Chemistry, University of Helsinki, P.O. Box 55, FIN-00014 Helsinki, Finland Received September 7, 1999. In Final Form: January 11, 2000 The surface reactions between trimethylaluminum (TMA) and deuterated water (D2O) in the deposition of Al2O3 were studied by using a mass spectrometer to determine the amount of the reaction product, methane (CH3D), produced in a flow-type atomic layer deposition (ALD) reactor during each deposition step. At low temperatures (
