Macromolecules 2008, 41, 6081-6088
6081
Semiconductor Block Copolymer Nanocomposites with Lamellar Morphology via Self-Organization Se´bastien Maria,† Andrei S. Susha,‡ Michael Sommer,† Dmitri V. Talapin,§ Andrey L. Rogach,‡ and Mukundan Thelakkat*,† Applied Functional Polymers, UniVersita¨t Bayreuth, UniVersita¨tsstr. 30, 95444 Bayreuth, Germany; Photonics and Optoelectronics Group, Physics Department and Center for Nanoscience (CeNS), Ludwig-Maximilians UniVersita¨t Mu¨nchen, Amalienstr. 54, 80799 Munich, Germany; and Department of Chemistry, The UniVersity of Chicago, Chicago, Illinois 60637 ReceiVed April 3, 2008; ReVised Manuscript ReceiVed June 9, 2008
ABSTRACT: Novel semiconductor block copolymers were synthesized using nitroxide-mediated radical polymerization (NMRP). They are comprised of a hole conductor block carrying tetraphenylbenzidine pendant units (PVDMTPD) and a second poly(4-vinylpyridine) (P4VP) block suitable for the preferential incorporation of n-type semiconductor nanocrystals. The conditions of NMRP for both monomers were optimized in order to get macroinitiators with well-defined molecular weights and very low polydispersity (
