Telecom-wavelength Bottom-up Nanobeam Lasers ... - ACS Publications

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Telecom-wavelength Bottom-up Nanobeam Lasers on Silicon-on-Insulator Hyunseok Kim, Wook-Jae Lee, Alan Cervantes Farrell, Akshay Balgarkashi, and Diana L. Huffaker Nano Lett., Just Accepted Manuscript • DOI: 10.1021/acs.nanolett.7b01360 • Publication Date (Web): 31 Jul 2017 Downloaded from http://pubs.acs.org on August 2, 2017

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Telecom-wavelength Bottom-up Nanobeam Lasers on Silicon-on-Insulator Hyunseok Kim1,*, Wook-Jae Lee2, Alan C. Farrell1, Akshay Balgarkashi3 & Diana L. Huffaker1,3,4 1

Department of Electrical Engineering, University of California Los Angeles, Los Angeles,

California 90095, United States 2

School of Engineering, Cardiff University, Cardiff CF24 3AA, United Kingdom

3

School of Physics and Astronomy, Cardiff University, Cardiff CF24 3AA, United Kingdom

4

California Nano-Systems Institute, University of California Los Angeles, Los Angeles,

California 90095, United States

Keywords Nanowire laser, nanobeam, telecom wavelength, room temperature, monolithic integration

1 ACS Paragon Plus Environment

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Abstract

Semiconductor nanowire lasers are considered promising ultra-compact and energy-efficient light sources in the field of nanophotonics. Although the integration of nanowire lasers onto silicon photonic platforms is an innovative path towards chip-scale optical communications and photonic integrated circuits, operating nanowire lasers at telecom-wavelengths remains challenging. Here, we report on InGaAs nanowire array lasers on a silicon-on-insulator platform operating up to 1,440 nm at room temperature. Bottom-up photonic crystal nanobeam cavities are formed by growing nanowires as ordered arrays using selective-area epitaxy, and single-mode lasing by optical pumping is demonstrated. We also show that arrays of nanobeam lasers with individually tunable wavelengths can be integrated on a single chip by simple adjustment of the lithographically defined growth pattern. These results exemplify a practical approach towards nanowire lasers for silicon photonics.


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Semiconductor nanowires are a promising platform for ultracompact lasers, which have high potential in the field of optical communications, bio- and chemical sensing, and quantum computing. As nanowires provide both gain from their bulk volume and optical feedback from their end facets (Fabry−Perot cavity), a single nanowire can operate as a sub-wavelength scale nanolaser without the need for external cavities. In particular, the high crystal quality of nanowires1 and the ability to incorporate three-dimensional heterostructures2 enable the nanowires to exhibit superior optical properties, while atomic-scale sidewall smoothness and large refractive indices ensure nanowire Fabry−Perot cavities to exhibit strong mode confinement and to achieve sufficient cavity quality (Q) factor3. By exploiting these notable features, nanowire lasers operating in ultraviolet, visible, and near-infrared wavelengths have been reported using both III-V and II-VI material systems3-6. Because nanowires can be grown on lattice-mismatched substrates owing to nanoscale interface areas, directly integrating nanowire lasers on silicon has also gained attention to utilize these nanolasers for silicon photonics and ultracompact inter- and intrachip optical communications. Contrary to typical nanowire lasers which attain strong optical feedback by horizontally laying nanowires onto low-index substrates, the achievement of lasing in vertical free-standing nanowires on silicon is challenging because the small index contrast between the nanowires and the substrate results in low reflectivity at the bottom interface. Several approaches have been proposed to overcome this limitation and to observe lasing from nanowires on silicon, such as employing a helical cavity mode7, enhancing the reflectivity by selective etching8, inserting an interlayer9, and forming random cavities comprised of tapered nanowires10. However, practical integration of nanowire lasers on silicon photonic integrated circuits (PICs) continues to be a significant challenge. To the best of our knowledge, there are no reports of monolithic nanowire lasers on silicon operating in the telecom-wavelength range.


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This may be attributed to difficulties in growing high-quality nanowires with proper bandgaps on silicon11, as well as non-radiative Auger recombination which increases as the bandgap is decreased5,12. Furthermore, the confinement factor and end-facet reflectivity decrease at longer wavelengths in sub-wavelength scale nanowire cavities, implying that the nanowire diameter and length must increase to support longer wavelength lasing13. Operation wavelengths of vertical free-standing nanowire lasers on silicon have thus been limited to shorter wavelengths ( 120 meV) at room temperature regardless of x, which is attributed to compositional fluctuations and polytypism in nanowires22,23 (Supporting Information Figure S7 and S8). Nanowire array cavities with different photonic lattice periods and fill factors are also grown on each sample by lithographically controlling the period (p) and diameter (d). Figure 3b shows lasing spectra from one of the nanobeam cavities on each sample with different x, which are measured by aligning the pump beam to the center of the cavities. As the pump spot size is 2 μm, the pumping area covers only the tapered section of the cavity. Lasing at longer wavelength is observed from the nanowire arrays with higher x and larger p and d, where the lasing peak positions at 1,120 nm, 1,230 nm, 1,320 nm, and 1,440 nm overlap well with the spontaneous emission spectra in Figure 3a. The light-in–light-out (L-L) plot, which represents an integrated cavity peak intensity as a function of the input pump power, is shown in Figure 3c for these four nanowire array lasers. Threshold pump powers of these lasers are estimated to be around 80−110 μJ/cm2, which are deduced from the position of the kinks in the linear fitting. It is interesting to note that the slope efficiency (differential quantum efficiency) shows a tendency to decrease if the laser operates at a longer wavelength, except the laser emitting at 1,230nm which shows a higher slope efficiency than the laser emitting at 1,120 nm. This tendency can be understood considering an exponential increase of Auger recombination coefficient for InGaAs with larger x25, which drastically increases non-radiative recombination at high-level carrier injection and decreases the internal quantum efficiency which is proportional to the slope efficiency26. We speculate that the reversed tendency between 1,120 nm and 1,230 nm lasers is stemming from the radiative efficiency of In0.33Ga0.67As nanowires being higher than In0.26Ga0.74As nanowires (Supporting Information Figure S10), which could


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be due to the material quality or core/shell interface quality. It should be highlighted that this is the first demonstration of monolithic nanowire lasers on a silicon platform operating at telecom-wavelengths. Room-temperature lasing in these vertical free-standing nanowire arrays reveals the validity of our approach in attaining a high cavity Q and confinement factor by forming bottom-up nanowire photonic crystals and achieving sufficient gain from InGaPpassivated InGaAs nanowires. Lasing characteristics of the laser operating at 1,320 nm, which exhibits a lasing threshold of 95 μJ/cm2 (Figure 3c), are further analyzed to demonstrate typical behaviors of optically pumped nanowire array lasers operating in the telecom-wavelength regime. Log-scale PL spectra in Figure 4a show relative emission intensities from the nanobeam laser when the input pump power is varied. A small cavity peak is observed above a broad spontaneous emission spectrum when the pump power is low. As the pump power is increased, the spontaneous peak blue-shifts due to a band-filling effect and the cavity peak also slightly blueshifts due to a carrier-induced change of the refractive index27. The cavity peak intensity rapidly grows as the pump power is increased, while spontaneous emission is clamped above the lasing threshold, resulting in a side-mode suppression ratio (SMSR) of 13 dB at 2.55 times the threshold power. This is in contrast to the spontaneous emission from nanowire arrays on a planar area of a 220 nm-thick SOI substrate, which is not clamped by increasing the pump power (Figure 4b). The cavity peak linewidth shows a sudden decrease around the lasing threshold, as depicted in Figure 4c, which is another indication of lasing action. The linewidth above the threshold is relatively high at around 2 meV, which is attributed to a pumping by ultrashort pulses that leads to a significant linewidth broadening by refractive index fluctuation6,28. A double-logarithmic plot of the L-L curve in Figure 4c shows an S-shape response, which indicates the transition to lasing from amplified spontaneous emission (ASE). A standard rate equation analysis is employed to extract a Q factor and a spontaneous emission


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factor β (Supporting Information Section II), which represents the portion of emitted photons coupled into a lasing mode. The Q factor of 495 is derived from the fitting which is significantly smaller than the Q factor calculated from the FDTD simulations, and this is attributed to fabrication imperfections and pumping conditions (Supporting Information Section I and II).

β of 0.16 is extracted from the rate equation fitting, where such a large β can only be accomplished from cavities with ultra-small mode volume and/or high cavity Q factor26. This result suggests that the proposed bottom-up nanobeam lasers have high potential for energyefficient light sources with extremely low threshold. The double-logarithmic L-L plots of lasers with different x and lasing wavelengths (inset in Figure 3c) show that slopes of integrated cavity peak intensities of these lasers are all different below and around the threshold. This implies that β of these lasers will all vary, while further study is necessary to understand the main factors governing these differences. One of the biggest advantages of our approach is that the lasing wavelength is determined from nanobeam cavity dimensions, which can be controlled by lithography. Laser arrays with various operation wavelengths can, therefore, be integrated on a single chip by lithographically varying the pitch and diameter of nanowires, which suggests the possibility for an ultracompact light source in wavelength-division multiplexing (WDM) systems. Figure 5a shows lasing spectra of seven In0.33Ga0.67As nanowire array lasers, which are grown on two SOI pieces under identical epitaxy conditions. The measured lasing wavelengths range from 1,187 nm to 1,256 nm, which reveals wide tunability of the operation wavelengths of laser arrays on a chip. The validity and accuracy of tuning the lasing wavelength by lithography are also demonstrated by comparing the measured wavelengths with FDTD simulations, as shown in Figure 5b. The lasing wavelengths of entire nanowire array lasers with different indium compositions (x = 0.26, 0.33, 0.42, and 0.48) (filled stars) are plotted together with nanowire array cavities which have not reached lasing due to the mismatch between the indium 10 ACS Paragon Plus Environment

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composition and the cavity mode wavelength (open stars) (Supporting Information Figure S11). As there is a slight non-uniformity between diameters of the nanowires constituting nanowire array cavities (typical standard deviation ~ 5 nm), an average value of nanowire diameters in the tapered section is used as the measured diameter in Figure 5b. The measured peak wavelengths show a clear dependence on the period and diameter, and exhibit a good agreement with FDTD results (lines) within ±20 nm error, substantiating the feasibility of wavelength control without the need of external cavities. We speculate several reasons for the error, such as nanowire diameter fluctuation, fabrication errors in silicon trench patterns, possible difference between the actual refractive index of nanowires and the index employed for FDTD simulations (n = 3.62), and a non-negligible effect of the nanowire height on a cavity mode wavelength as the height of nanowires does not match exactly with simulations (h = 700 nm) (Supporting Information Figure S12). The demonstration of nanobeam laser arrays on an SOI substrate with controllable lasing wavelengths suggests that the proposed nanolasers have high potential for chip-scale optical interconnects. In conclusion, we have demonstrated monolithic nanowire array lasers on an SOI platform operating in the wavelength range of 1,100 nm – 1,440 nm. Room-temperature lasing from these lasers is achieved by optical pumping, which reveals that nanobeam cavities composed of InGaAs/InGaP core/shell nanowires exhibit high crystal quality and superior cavity properties. Lithographic control of nanobeam cavity dimensions has facilitated monolithic integration of laser arrays on a single chip with various wavelengths, suggesting a path towards an ultracompact light source in WDM systems. Although continuous-wave lasing at room temperature is not demonstrated due to thermal roll-over of fabricated devices, we speculate that improving the uniformity of nanowire dimensions, and the quality of passivation shells by optimizing the fabrication and growth conditions will enable continuous-wave lasing operation by reduced threshold gain and enhanced radiative efficiency. Electrical injection of


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nanowire array lasers will be the next step for practical application to chip-scale data communications, which could be accomplished by growing doped nanowire arrays on doped SOI substrates followed by metallization. We believe that the proposed nanolasers can also be applied to low-cost and multi-spectral sensing platforms, quantum computing, and all-optical circuits.


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Methods Fabrication. A lightly p-doped (10 Ω.cm) SOI(111) wafer is used as a growth platform. First, trench patterns are defined by standard electron-beam lithography. Then, a mixture of SF6, CF4, and CHF3 plasma is used to etch 180 nm-deep trenches on 220 nm-thick SOI layers using ZEP520A resist as an etch-mask. A 20 nm-thick silicon nitride (Si3N4) mask is then deposited using low-pressure chemical vapor deposition on the patterned substrate, followed by electron-beam lithography and dry etching to pattern nanoholes and expose silicon for selective-area growth. Nanowire growth. The MOCVD growth is carried out in a low-pressure (60 Torr) vertical reactor, using hydrogen as a carrier gas and triethylgallium (TEGa), trimethylindium (TMIn), tertiarybutylarsine (TBA), and tertiarybutylphosphine (TBP) as precursors. The sample is first baked at 850 ° C for 10 min flowing hydrogen to thermally etch native oxide. Next, GaAs seeds are grown in nanoholes at 680 ° C for 3 min under the partial pressure of TEGa = 2.25 × 10-5 atm and TBA = 2.02 × 10-3 atm. InGaAs nanowires are then grown for 13 min under different growth temperatures and partial pressures to tune the indium composition. The partial pressures and temperatures used are, TEGa = 2.06 × 10-5 atm and TMIn = 8.70 × 10-6 atm at 680 ° C for In0.26Ga0.74As, TEGa = 1.76 × 10-5 atm and TMIn = 1.18 × 10-5 atm at C for 665 ° C for In0.33Ga0.67As, TEGa = 1.61 × 10-5 atm and TMIn = 1.32 × 10-5 atm at 655 ° In0.42Ga0.58As, and TEGa = 1.61 × 10-5 atm and TMIn = 1.32 × 10-5 atm at 635 ° C for In0.48Ga0.52As, where TBA is fixed to 2.02 × 10-3 atm in all growths. Next, In(Ga)P shells are grown at 600 ° C for 35 s under different partial pressures to closely lattice-match the shell with the InGaAs core. The partial pressures used are, TEGa = 2.25 × 10-6 atm, TMIn = 6.63 × 10-6 atm and TBP = 4.26 × 10-4 atm on In0.26Ga0.74As, TEGa = 1.76 × 10-6 atm, TMIn = 1.18 × 10-5 atm and TBP = 4.39 × 10-4 atm on In0.33Ga0.67As, and TMIn = 1.03 × 10-5 atm and TBP =


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1.55 × 10-3 atm on In0.42Ga0.58As and In0.48Ga0.52As. After the growth, samples are cooled down to 300 ° C by flowing TBP to prevent nanowire desorption.


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Associated content Supporting Information. The Supporting Information is available free of charge on the ACS Publications website. Nanobeam cavity design. Rate equation analysis. Nanowire growth condition. Measurement setup. Optical properties of nanowires. Nanobeam cavity emission characteristics. FDTD simulations of cavity mode wavelengths.

Author information Corresponding author *E-mail: [email protected]

Acknowledgements The authors gratefully acknowledge the generous financial support of this research by AFOSR (through FA9550-15-1-0324) and Sêr Cymru National Research Network in Advanced Engineering and Materials.

Competing financial interests The authors declare no competing financial interests.


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Figures and Figure legends a p

p p p5 p4 p3 p2 p1 p1 p2 p3 4 5

d

InGaP (shell) InGaAs (core)

h

Si z y

x

b Ez

Q = 134,000

Max

Nanowire 0 Si z

Trench

x

c Ez

SiO2

Nanowire

Min Max 0

y

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Figure 1 | Design of bottom-up nanobeam lasers on an SOI platform. (a) Schematic illustration of an InGaAs/InGaP core/shell nanowire array on an SOI platform. (b) Electric field profiles (Ez) of a fundamental TM-mode in xz-plane, and (c) a horizontal cross-section along the white dashed line in b, both showing that the field is tightly confined in nanowires. A cavity Q of 134,000 and a resonance wavelength of 1,310 nm are obtained when p = 350 nm, d = 180 nm, and h = 700 nm.


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b

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Trench

Si

Nanowire

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Si SiO2

Si

Figure 2 | Nanowire arrays grown on an SOI platform. (a) 35° tilted SEM images of a nanowire array cavity, and (b) a close-up view, showing high uniformity and smooth sidewalls. (c) Top-view SEM image showing the nanowires aligned to the direction of the silicon layer. (d) Cross-sectional SEM image of nanowires on a patterned SOI substrate measured by slicing the sample by focused ion beam etching. Scale bars, 500 nm


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300 K

x= p= d=

0.26 0.48 0.42 0.33 300 nm 350 nm 350 nm 400 nm 144 nm 149 nm 185 nm 199 nm

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c

Figure 3 | Optical characteristics of nanowire arrays at room temperature. (a) PL spectra of InGaAs nanowires grown under different conditions. x of 0.26, 0.33, 0.42, and 0.48 are deduced from PL spectra. Atmospheric absorption around 1,150 nm and 1,400 nm distorts the shape of the PL spectra (Supporting Information Figure S9). (b) Lasing spectra of nanowire array cavities on each sample. Inset: emission pattern above lasing threshold showing an interference fringe pattern. Scale bar, 5 μm. (c) L-L curves of nanobeam lasers in b. Lasing 2

thresholds are estimated to be around 80−110 μJ/cm from the linear fitting. Inset: L-L curves plotted in a double-logarithmic scale.


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a

b

c

SMSR ~ 13 dB

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Figure 4 | Lasing characteristics of a nanobeam laser operating at 1,320 nm. (a) Pump power-dependent PL spectra of the In0.42Ga0.58As nanowire array laser, plotted in a log-scale. Spontaneous emission is clamped above the threshold, and SMSR of 13 dB is achieved at the 2

pump fluence of 242 μJ/cm . (b) PL spectra of a nanowire array that does not form a cavity, showing that the spontaneous emission is not clamped by increasing the pump power. (c) Double-logarithmic L-L curve of the nanowire array laser showing an S-shape response and a sudden decrease of linewidth around lasing threshold. β of 0.16 is extracted from the rate equation fitting.


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b 300 K

Figure 5 | Nanobeam laser arrays with lithographically controllable operation wavelengths. (a) Lasing spectra of seven In0.33Ga0.67As nanobeam laser arrays grown on two samples. A spontaneous emission spectrum (grey line) is also shown for a reference. (b) Measured lasing wavelengths of nanobeam lasers (filled stars) plotted together with FDTD simulation results (lines). Nanobeam cavities which have not reached lasing (open stars) are also shown for comparison.


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Insert Table of Contents Graphic and Synopsis Here

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