Chemistry of Hello: The Next Generation of Circuitry

1.0 -0.5 0.0 0.5 1.0 Cu rr en t (e -6 ) Voltage R = fluoroalkyl, alkyl, etc. ... 29 Samsung Transparent OLED TV Xconomy.com Transparent Displays ...
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02/02/2016

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2016 Material Science Series http://bit.ly/2016MaterialScienceSeries

Thursday, March 10, 2016

Chemistry of Hello: Lithium Ion Batteries Challenges and Opportunities for Personal Electronics Applications Dee Strand, Chief Scientific Officer, Wildcat Discovery Technologies Mark Jones, Executive External Strategy and Communications Fellow, Dow Chemical

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2016 Material Science Series “Chemistry of Hello: The Next Generation of Circuitry”

Tobin Marks

Mark Jones

Professor of Catalytic Chemistry, Materials Science and Engineering, and Applied Physics at Northw estern University

Executive External Strategy and Communications Fellow, Dow Chemical

Co-Founder and Member of Scientific Advisory Board at the Polyera Corporation

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GOAL: FLEXIBLE ELECTRONIC CIRCUITRY RF ID tags, display backplanes, e-books, sensors, “smart” packaging, “smart” displays, photovoltaics, “internet of things”

Science Needed: Versatile, Unconventional Materials • • •

n-Type Organic Conductors for CMOS Better Gate Dielectrics Better Understanding of Charge Transport, Interfaces

Basic Building Block: Field-Effect Transistor (FET) NRC/National Academies, “The Flexible Electronics Opportunity” National Academies Press, 2014

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Transistor Structure & Function Output plot

VD VG

semiconductor source charge carriers drain dielectric

gate / substrate

NO CHARGE CARRIERS BETWEEN s AND d => ID = 0

OFF VG = 0

ON VG  0

CREATES CHARGE CHANNEL IN SEMICONDUCTOR LAYER => ID  0

New Materials Must Optimize: • Carrier mobility () & Stability • Current on/off ratio (Ion/Ioff) • Threshold voltage (VT) • Subthreshold swing (SS) • Dielectric capacitance (Ci)

Transfer plot

LCD Display Backplanes use a-Si:H  ~ 0.5 cm2/V∙s-1Ion/Ioff > 106 n-type only, poor current carrier

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Lecture Outline I. Introduction, Challenges, Opportunities II. New n-Type Organics Rylenedimides source

III. Nanoscopic Dielectrics Self-Assembled Nanodielectrics (SAND)

drain

Semiconductor

Dielectric

Gate

IV. Amorphous Oxides Transistors

V. Conclusions, Acknowledgments 14

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Materials Design for n-Type Semiconductors Enablers of Organic CMOS p-Type = Radical cation (h+) conductor through highest occupied MOs (HOMOs) n-Tyep = Radical anion (e-) conductor through lowest unoccupied MOs (LUMOs)

R

R

Substituents Enhance solubility

X

Molecule

X

Substituents Lower HOMO, LUMO energies for electron transport, environmental stability

Flat architecture - stacking Extended  system to minimize Marcus reorganization energy

High-yield coupling chemistry

R

R

Linker

X

Polymer

X

n

Reviews: MRS Bulletin, 2010, 35, 1018; Accts. Chem. Res. 2011, 44,501; Chem. Rev. 2014, 114, 8943.

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Cyanoperylenes. Completely Air-Stable n-Type Semiconductors  High-yield syntheses  Good packing for efficient transport  Reduction potentials close to 0 V !(vs SCE)  Low-lying LUMO (est. -4.77 eV)  Smooth, interconnected films

CN O

O

R N

N R

O

O NC

R = fluoroalkyl, alkyl, etc.

General : air stability, Ion:Ioff, Vth tunable via CN, R substituents Suitable molecular packing, electrochemistry, film formation Crystal Structure

AFM

Electrochemistry Current (e-6)

1.0

0.5

0.0

-0.5

-1.0

1.5

1.0

0.5

0.0

-0.5

-1.0

-1.5

Voltage

Rylene review: Advanced Materials, 2011, 23, 268.

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Status of n-Type Molecule, Polymer Development Best: Printable n-type air-stable polymer, μ > 2.0 cm2/Vs

AMBIPOLAR N-TYPE AMBIPOLAR P-TYPE

N-TYPE AMBIPOLAR

P-TYPE AMBIPOLAR

Northwestern Start-up

Nature 2009, 457, 679

Theoretical Guidance. Molecular Cluster, Band Structure Approaches Band Structure

 n- vs. p- related to LUMO and Homo energies  HOMO, LUMO bandwidths comparable  Twisting from cofacial orientation energetically favorable, greater bandwidths

 Marcus reorganization energies very important M. Ratner, G. Hutchison, S. Koh, R. Ortiz, A. Freeman J. Am. Chem. Soc., 2005, 127, 2339 ; 2005, 127,16866; Advan. Funct. Mater, 2008, 18, 332; J. Phys. Chem. C, 2016, submitted t18

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Inkjet-Printed Bithiophene-Imide-Based Air-Stable Complementary Polymer Inverters Gain ~ 40 at VDD = - 100V

Guo, X.; Ortiz, R. P.; Noh, Y.-Y.; Baeg, K.-J.; Facchetti, A.; Marks, T. J. J. Am. Chem. Soc..2015, in press.

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Audience Survey Question ANSWER THE QUESTION ON BLUE SCREEN IN ONE MOMENT

Which of the following statements are TRUE? 1. All that is needed for an organic semiconductor is a molecular π system 2. Whether an organic semiconductor is p-type or n-type is largely a function of the associated HOMO and LUMO energies 3. Electrical conductivity = mobility x carrier concentration

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Audience Survey Question ANSWER THE QUESTION ON BLUE SCREEN IN ONE MOMENT

Which of the following statements are TRUE? 1. All that is needed for an organic semiconductor is a molecular π system 2. Whether an organic semiconductor is p-type or n-type is largely a function of the associated HOMO and LUMO energies 3. Electrical conductivity = mobility x carrier concentration

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Need for Better Gate Dielectrics Motivates Self-Assembled Nanodielectric (SAND) Importance Low mobility of unconventional semiconductors Lower operating voltages crucial for practical electronics Large densities of trapped charge → hysteresis

Typical Organic FET Data

Gate Dielectric Functions as capacitor Stabilizes charged carriers induced by gate electric field + ++ ++ ++ ++ ++ +

Semicond.

Parallel plate capacitor model

Ci 

k d

Intel: HfO2

0

D

S

ISD~ VG Ci

G

Dielectric - - -- - - -- - - -- - - - -

SAND

Ci = capacitance per area, k = dielectric constant ε0 = vacuum permittivity, d = thickness

How to increase Ci :  Increase dielectric constant (κ)  Reduce thickness (d) ReviewsAdvan. Mater. 2009; Chem. Rev. 2010; Accts. Chem. Res. 2014

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SAND Gate Dielectrics Enhance Organic & Inorganic Transistor Performance •

n- and p-Type Organic Semiconductors: Molecular and Polymer



Sorted Carbon Nanotubes, Graphene



ZnO and In2O3 Nanowires ( μ = 3000 cm2/Vs)



GaAs, MoS2



Oxide Thin Films



Conventional Si and Nanomembrane Si

Si Nanomembrane TFTs

Radiation-Hard SAND TFTs

Active Matrix ZnO NW/SAND OLED Display

Materials module deployed on the International Space Station. Inset: SAND-based transistors fabricated by Northwestern scientists Reviews: Advan. Mater. 2009, 21, 1407; Chem. Rev., 2010, 110, 205; Accts. Chem. Res. 2014

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Next-Generation SANDs Customized for Specific Function Type III SAND Non-Ambient Growth Hydrocarbon Solvents

V-SAND Zr-SAND & Hf-SAND VA-SAND Ambient Growth Vapor Growth Vapor Growth Avoid Solvents Avoid Solvents Alcohol Solvents ALD Al2O3

ALD Al2O3 MRS Bulletin, 2010, 35, 1018; J. Am. Chem. Soc., 2011, 133, 10239; ACS Nano, 2012; Accts. Chem. Res. 2014 24

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Zr, Hf-SAND Self-Assembled Nanodielectrics TEM Cross-section

• Organic/inorganic hybrid multilayer • Solution processable under ambient • Controllable thickness, large-area uniformity, well-defined nanostructure • High capacitance, superior insulating properties • 350° C thermal stability

Fabrication • Self-assemble phosphonic acid-based polarizable π-molecule • Spin coat ultra-thin ZrOx primer & interlayers

Organic/Inorganic TFTs Pentacene

Capacitance characteristics

Zn-Sn-O

800

2

Capacitance (nF/cm )

600 800 2

400

Capacitance (nF/cm )

Properties M-SAND-4 (4 layer) • Leakage: 10 -7 A/cm2 @2 MV/cm • C: 465 nF/cm2 (Zr), 1 μF/cm2 • k ≈ 11 (Zr), 20 (Hf) • Roughness(RMS): 1

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Sangwan, Hersam, Marks, APL, 2014, 104, 083503

SAND Design. First-Principles Calculation of Dielectric Response in Molecule-Based Materials Scheme for plane-wave DFT computation of static dielectric response:

ηstatic(z) ηstatic(z) w/ substitution

ηstatic(z) versus coverage

ε = 2.39; Experiment: ε = 2.34



Benzene Crystal: Computation:



First powerful tool for the design of new hybrid dielectric materials Heitzer, Marks, Ratner, JACS, 2013; JACS, 2015

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Materials Design. First-Principles Calculation of Dielectric Response in SAND-Type Materials How to increase dielectric constant (ε) and capacitance (C) of molecular films?

Typical organic films have ε ≈ 3.0, C < 1.0 μF/cm2

High Surface Coverage Low Polarizability

Low Surface Coverage Large Polarizability

ε ~ 3.0

ε ~ 3.0

High Surface Coverage Computed dielectric constant of polyenes with polarizable substituents achieve ε > Large Polarizability 12 at 4 molecules/nm2 coverage dielectric constant of alkane & ε =Computed Dielectric Constant ε > 12.0Heitzer, Marks, Ratner, ACS Nano 2014; JACS 2015. alkyne chains at varying surface coverages. ε > 7.0 (C > 3.0 μF/cm2)

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Technology Motivation

Transparent Electronics Will Use Oxide TFTs + Organics Transparent Displays

Heads-up Displays Artefactgroup.com

Samsung Transparent OLED TV

Xconomy.com Sharp IGZO Displays

Amorphous Oxide Driving Electronics: In-Ga-Zn-O? Can We Hybridize with Organic Materials?

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Audience Survey Question ANSWER THE QUESTION ON BLUE SCREEN IN ONE MOMENT

Which of the following statements are TRUE? 1. Any polarizable substance will be a good gate dielectric for transistors 2. HfO2 is superior to SiO2 as a transistor gate dielectric because it is denser

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Audience Survey Question ANSWER THE QUESTION ON BLUE SCREEN IN ONE MOMENT

Which of the following statements are TRUE? NONE 1. Any polarizable substance will be a good gate dielectric for transistors 2. HfO2 is superior to SiO2 as a transistor gate dielectric because it is denser

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TRANSPARENT CONDUCTING OXIDE (TCO) ELECTRONIC STRUCTURE MODEL J. Goodenough

Energy

Metal Cation Conduction Band np

• Lies above top of O-2pπ VB by ΔEgap ≥ 3.1eV • Low enough in energy to accept electrons

ns

CB

εF

• Itinerant electrons cannot be excited into higher

ED

band by light absorption

Dope to make conductive (e.g., Sn in In2O3)

Cation Requirements Usually Met by VB

O2-: 2p6

• 5s CB of Cd2+, In3+, Sn4+

N(ε) (DOS)

• Burstein-Moss increase in ΔEgap with doping

What are the Limitations and Implications of this Picture? Can We Use These for TFTs? Freeman, Medvedeva Zunger PNAS 2002, JACS, 2007, MRS Bulletin, 2010, 35, 1018

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Attractions of Amorphous Oxide Semiconductors (AOSs) for High-Performance TFTs Disordered Crystal Structures



High Mobility



Low Deposition &

Processing Temperatures •

Very Smooth Surfaces, No Grain Boundaries



Mechanical Flexibility



Optical Transparency



Properties Tunable between

Film XRD and Electron Diffraction

Insulating, Semiconducting, Highly Conducting by Doping

Bellingham, Hosono, Fortunato, Mason, Wager

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Transparent a-Zn-In-Sn-O TFTs Grown by Pulsed Laser Deposition

Protective Layer

Transmittance ~75% (glass ~90%) TFT Performance: μ ~160 cm 2/V·s (~20 on SiO2) VG & VDS ~1.0 V VT ~0.2 V Ion:Ioff ~105 Chang, Marks Advan. Mater. 2010, 22, 2333; J. Am. Chem. Soc. 2010, 132, SS ~0.13 V/decade 11934.

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Low Temperature Combustion Synthesis of a-Oxide Films

Solution Precursors Reaction Characterization Conventional Combustion

Product DTA (V/mg)

Combustion Condensed Oxide Lattice

Conventionalll

Reaction Coordinate

2

(cm /Vs)

1

10

In2O3

Exo

20

20

0 100

100

0

In2O3

75

50

50

25 200 400 600 o Temp ( C)

1

10

-1

10

-3

10

-5

10

-7

10

-1

10

-3

10

-3

Al2O3

10

dielectric -7

200 300 400 o Temp ( C)

10

-5

10

ZTO 200 300 o 400 Temp ( C)

-5

10

200 400 600 o Temp ( C)

TCO Conductivity

Combustion

1

IZO

75

25

10

-1

10

40

10

Transistor Performance (Si/SiO2 Substrates)

Conventional

60

30

IZO 200 300 400 o Temp ( C)

Conductivity (S/cm)

Ignition

Mass (%)

Energy

Oxidizer + Organic Fuel

3

10

1

10

-1

10

ITO

200 300 400 500 o Temp ( C)

Kim, Fachetti, Kanatzidis, Marks Nature Materials 2011,10, 382; JACS 2016, in press.

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Result: Inkjet Printed, Combustion-Processed Flexible Amorphous In2O3 Transistors on Plastic Transistor Characterization Printed a-In2O3

VDS = 1V

VG =1.00V

2.0 1E-7

I DS IG

1E-8

IDS (A)

IDS & IG (A)

1E-6

500 m

3.0

1E-5

1.0 0.80V

1E-9 1E-10 -0.5 0.0 0.5 1.0 VG (V)

Research Agenda • Materials Scope • Microstructure Evolution • Performance Limits, SAND

0.0

0.60V

0.0

0.5 1.0 VDS (V)

Plastic: μ = 8 cm2/V·s Ion:Ioff ~ 104 Glass: μ = 40 cm2/V·s Ion:Ioff ~105 a-Al2O3 Gate Dielectric SAND Also Works 37

Kim, Fachetti, Kanatzidis, Marks Nature Materials 2011,10, 382; JACS 2015, in press.

Inkjet-Printed Combustion a-IGZO on Hf-SAND Dramatic operating voltage reduction

SiO2 Dielectric μ ≈ 5 cm 2/Vs High operating voltage

Hf-SAND Dielectric μ MAX > 40 cm2/Vs All-solution processed